Discontinued (Discontinued) ST0230 Tungsten Carbide (WC) Sputtering Target

Tungsten Carbide (WC) Sputter Target Description

The sputter target made from Tungsten Carbide (WC) is a high-performance material developed for advanced sputtering applications. It is manufactured with a high purity (≥99%) composition and ensures excellent performance under RF sputtering conditions. Its excellent thermal stability and wear resistance make it an ideal choice for critical applications in the semiconductor industry, surface coating, and microelectronics. The target's ability to ensure uniform film deposition increases the efficiency and longevity of the sputtering process even under the most challenging conditions.

Tungsten Carbide (WC) Sputtering Target Applications

- Sputtering deposition: Provides uniform thin films for integrated circuits and modern electronics.
- Surface coatings: Enhances the wear resistance and thermal stability of industrial tools and machines.
- Microelectronics: Essential for the fabrication of semiconductors and MEMS devices with high performance requirements.
- Research and development: Suitable for experimental deposition processes and new material innovations.

Tungsten Carbide (WC) Sputtering Target Packing

Our Tungsten Carbide (WC) sputter targets are carefully packaged to preserve their quality and integrity. The vacuum-sealed packaging is available in standard formats. Custom packaging is also available upon request to meet specific application and shipping requirements.

Frequently Asked Questions

Q: What is Tungsten Carbide used for in sputter targets?
A: Sputter targets made of Tungsten Carbide are known for their exceptional durability, high thermal stability, and wear resistance, making them ideal for deposition processes in the semiconductor and coating industries.

Q: What type of sputtering is used with this target?
A: This target is specifically designed for RF sputtering, ensuring efficient film deposition with uniform thickness.

Q: Can these targets be customised in size and shape?
A: Yes, the Tungsten Carbide (WC) sputter targets are available in standard disc shapes or can be tailored for specific application needs.

Q: What is the significance of the high purity (≥99%) of this target?
A: The high purity ensures minimal contamination, thereby providing consistent performance and high-quality film deposition for advanced applications.

Q: Are there any special storage and handling instructions for these targets?
A: It is recommended to store the sputter target in a controlled environment and to handle it carefully to maintain its structural integrity and performance over time.