Discontinued (Discontinued) ST0240 Dysprosium Fluoride (DyF₃) Sputtering Target

Dysprosium Fluoride (DyF₃) Sputtering Target Description

The Dysprosium Fluoride (DyF₃) sputtering target has been developed for highly precise sputtering processes in advanced industrial applications. Manufactured with a purity of ≥99%, the target ensures reliable performance and uniform layer deposition, making it particularly suitable for semiconductor manufacturing, display technology, and specialised coating applications. Its high melting point and stable chemical properties provide durability and resistance even under extreme processing conditions.

Dysprosium Fluoride (DyF₃) Sputtering Target Applications

- Semiconductor manufacturing: Enables the uniform deposition of thin films, which are essential for integrated circuits and the production of components.
- Display manufacturing: Facilitates the creation of high-resolution flat screens and OLED displays.
- Coating applications: Suitable for the deposition of robust and durable coatings in optical and electronic devices.
- Research and development: Ideal for the development of prototypes and advanced material studies exploring next-generation sputtering techniques.

Dysprosium Fluoride (DyF₃) Sputtering Target Packaging

Our Dysprosium Fluoride (DyF₃) sputtering targets are packaged with utmost care to maintain their high purity and performance. The standard packaging includes vacuum-sealed containers that protect the targets from moisture and environmental contamination. Custom packaging options are also available to meet specific industrial requirements.

Frequently Asked Questions

Q: For which applications is a Dysprosium Fluoride (DyF₃) sputtering target best suited?
A: It is primarily used in semiconductor processing, display manufacturing, and precision coating applications where consistent deposition performance is critical.

Q: How is the high purity of the DyF₃ target ensured?
A: The target is produced under strict quality control measures and using advanced cleaning processes that guarantee a purity level of ≥99%.

Q: What advantages does a DyF₃ target offer during sputtering processes?
A: Its excellent chemical stability, high melting point, and uniform sputtering properties contribute to consistent film quality and reliability in high-technology applications.

Q: Are there custom shapes or sizes available for this sputtering target?
A: Yes, the product can be supplied in the form of discs or manufactured to custom specifications to meet industry-specific requirements.

Q: How should Dysprosium Fluoride (DyF₃) sputtering targets be stored to ensure longevity?
A: They should be stored in a cool, dry environment, preferably in vacuum-sealed packaging, to avoid contamination and maintain their high purity over time.