ST0246 Magnesium Fluoride (MgF₂) Sputtering Target

Catalogue Number	ST0246
Composition	MgF₂
CAS Number	7783-40-6
Purity	≥99% (99.9% / 99.99% available)
Shape	Discs, or Custom-made
Synonyms	Magnesium Fluoride Sputtering Target, MgF2 Target, Optical Coating Target

Stanford Advanced Materials aims to advance materials science through innovative and precise technical solutions. Our products are developed according to strict industry standards to ensure exceptional performance and reliability in each application.

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FAQ

Q: What purity MgF2 target do I need for optical coatings?

A: 99.9% purity is sufficient for most anti-reflective and protective optical coatings. 99.99% is recommended for laser optics and high-precision semiconductor applications where trace impurities can affect transmission or cause defects.

Q: Why is RF sputtering required for MgF2?

A: MgF2 is an electrical insulator. DC sputtering causes charge accumulation on the target surface, which leads to arcing and process instability. RF sputtering is necessary.

Q: Do MgF2 targets need bonding?

A: Yes, bonding is advised. MgF2 is brittle and has low thermal conductivity. Without appropriate bonding to a cooled backing plate, thermal stress can fracture the target during sputtering. Indium bonding is standard; elastomer bonding is available for systems that cannot utilise indium.

Q: What is the typical sputtering rate for MgF2?

A: Sputtering rates depend on your RF power, pressure, and system configuration. Typical rates range from 5-15 Å/sec at 3-5 W/cm². Please contact us with your system details for specific recommendations.

Q: What is the lead time for a custom MgF2 target?

A: Standard discs (2"-6") typically ship within 1-2 weeks. Custom shapes require 2-3 weeks depending on complexity.

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Catalog Number	ST0246
Material	Magnesium Fluoride (MgF₂)
Purity	≥99% (99.9% / 99.99% available)
CAS Number	7783-40-6
Colour/Appearance	White crystalline
Melting Point	1,261°C
Theoretical Density	3.15-3.18 g/cm³
Relative Density	>98%
Refractive Index (550nm)	1.38
Transmission Range	0.12-8 μm
Sputter Method	RF
Type of Bond	Indium, Elastomer
Standard Diameters	2", 3", 4", 6"
Thickness	0.125", 0.250", or custom
Packaging	Vacuum-sealed

Property	Specification
Material	Magnesium Fluoride (MgF₂)
Symbol	MgF₂
Melting Point	1263℃
Density	3.15 g/cm³
Sputter	RF
Type of Bond	Indium, Elastomer
Available Sizes	Customized

ST0246 Magnesium Fluoride (MgF₂) Sputtering Target

Magnesium Fluoride (MgF2) Sputtering Target Description

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Magnesium Fluoride (MgF₂) Sputtering Target Applications

Magnesium Fluoride (MgF₂) Sputtering Target Packing

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FAQ

Q: What purity MgF2 target do I need for optical coatings?

Q: Why is RF sputtering required for MgF2?

Q: Do MgF2 targets need bonding?

Q: What is the typical sputtering rate for MgF2?

Q: What is the lead time for a custom MgF2 target?

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