Discontinued (Discontinued) ST0257 Yttrium Fluoride (YF3) Sputtering Target

Yttrium Fluoride (YF3) Sputtering Target Description

The Yttrium Fluoride (YF₃) Sputtering Target is designed for high-precision thin film deposition processes in modern industrial applications. This target is manufactured focusing on high purity and consistent quality, making it ideal for applications requiring reliable performance under stringent conditions. Its crystalline structure and physical properties ensure stable sputtering processes, making it highly valued in areas such as microelectronics, optics, and sensor technology. Custom shapes and sizes of the target provide design versatility while maintaining optimal deposition characteristics.

Yttrium Fluoride (YF3) Sputtering Target Applications

- Thin Film Deposition: Essential for producing uniform, high-quality thin films in semiconductors and microelectronic devices.
- Optical Coatings: Suitable for the production of optical components requiring precise layer uniformity and durability.
- Sensor Technologies: Used in advanced sensor manufacturing, offering reliable performance in demanding environments.
- Research and Development: Widely used in R&D facilities for exploring and developing new sputtering processes and advanced materials.
- Industrial Coatings: Utilised in the manufacture of protective and functional coatings where stability and consistency are critical.

Yttrium Fluoride (YF3) Sputtering Target Packing

Our Yttrium Fluoride (YF₃) Sputtering Target is securely packaged to preserve its purity and integrity during storage and transport. Custom packaging solutions are available to meet specific requirements, ensuring the product arrives in optimal condition for industrial use.

Frequently Asked Questions

Q: What is the primary use of the Yttrium Fluoride (YF₃) Sputtering Target?
A: It is primarily used for thin film deposition in applications such as microelectronics, optical coatings, and sensors.

Q: What advantages does the high purity (≥99%) of the target provide for sputtering applications?
A: High purity minimises contamination during sputtering, leading to improved film quality, uniformity, and device performance.

Q: Can the Yttrium Fluoride (YF₃) Sputtering Target be customised?
A: Yes, the target is available in disc form or custom shapes to meet specific manufacturing requirements.

Q: Which industries benefit most from YF₃ sputtering targets?
A: Industries such as semiconductor manufacturing, optics, sensors, and modern materials research greatly benefit from these targets.

Q: How should the sputtering target be stored and handled?
A: It should be stored in a clean, dry environment with protective packaging to avoid contamination and mechanical damage, ensuring optimal performance during use.