ST0279 Indium Sulfide (In2S3) Sputtering Target

Indium Sulfide (In2S3) Sputtering Target Description

The Indium Sulfide (In2S₃) Sputtering Target is engineered for high-precision applications in thin-film deposition and advanced electronic manufacturing. Utilizing top-grade materials and state-of-the-art fabrication processes, this target ensures consistent performance, high film uniformity, and exceptional reliability under various sputtering methods including RF, RF-R, and DC. Its high melting point and optimized density make it suitable for demanding industrial environments, while customizable sizes cater to diverse application requirements.

Indium Sulfide (In2S3) Sputtering Target Applications

· Thin Film Deposition: Ideal for creating high-quality films in electronics and photovoltaic devices.
· Semiconductor Manufacturing: Offers precise material deposition for cutting-edge device fabrication.
· Photovoltaic Cells: Provides uniform deposition critical for efficient solar cell performance.
· Scientific Research: Serves as a reliable material for experimental setups in advanced materials research.

Indium Sulfide (In2S3) Sputtering Target Packaging

Our In2S₃ Sputtering Targets are packaged with utmost care to preserve their purity and performance integrity. Typically, the targets are vacuum-sealed and securely packed to prevent contamination and mechanical damage during transportation.

Frequently Asked Questions

Q: What sputtering methods are compatible with the Indium Sulfide (In2S₃) Sputtering Target?
A: The target supports RF, RF-R, and DC sputtering methods, making it versatile for a range of applications.

Q: How do you maintain a high purity level (≥99%) in the sputtering target?
A: Our rigorous quality control processes and advanced fabrication techniques ensure that every batch achieves and maintains the high purity standard.

Q: Can the sputtering targets be produced in customized sizes?
A: Yes, aside from our standard disc shapes, we are happy to provide customized sizes to meet your specific project requirements.

Q: What are the main applications of the Indium Sulfide (In2S₃) Sputtering Target?
A: It is predominantly used in thin-film deposition, semiconductor manufacturing, photovoltaic cell production, and advanced materials research.

Q: How does the high melting point contribute to the target’s performance during sputtering?
A: The high melting point (1010℃) ensures excellent thermal stability, allowing the target to perform reliably even under high-temperature sputtering conditions.