ST0295 Lanthanum Boride (LaB6) Sputtering Target

Lanthanum Boride (LaB6) Sputtering Target Description

The Lanthanum Boride (LaB6) sputtering target is developed for efficient sputtering processes in advanced industrial applications. Manufactured from high-purity (≥99%) LaB₆ and precisely engineered, this sputtering target offers excellent layer uniformity and adhesion. Its high melting point (2528℃) and controlled density (4.72 g/cm³) ensure reliable performance under demanding sputtering conditions. The product is ideal for deposition in areas such as microelectronics, optics, and coating technologies, providing a solution for the production of high-quality thin films.

Lanthanum Boride (LaB6) Sputtering Target Applications

- Vacuum Coating: Suitable for depositing high-quality thin films in microelectronics and for optical components.
- Semiconductor Fabrication: Used in processes that require precise and uniform layer deposition.
- Surface Engineering: Applied in the production of wear-resistant and corrosion-protective coatings.
- Scientific Research: Essential for experiments requiring uniform sputter performance and high-purity materials.

Lanthanum Boride (LaB6) Sputtering Target Packaging

The Lanthanum Boride (LaB6) sputtering target is securely packaged to ensure its integrity during storage and transport. Each unit is carefully packaged and labelled according to industry standards to guarantee the product's optimum condition upon delivery. Custom packaging solutions are available upon request to meet specific customer requirements.

Frequently Asked Questions

Q: What sputtering system is best suited for the LaB6 sputtering target?
A: This target is optimised for RF sputtering systems, ensuring efficient and uniform deposition during thin film processing.

Q: How does the high melting point of LaB6 affect its performance?
A: The high melting point (2528℃) of LaB6 enables it to withstand high-energy sputtering processes, leading to improved stability and durability during deposition.

Q: Can the LaB6 sputtering target be customised in size and shape?
A: Yes, the target is available in standard disc shapes and can also be custom-manufactured to meet specific application and equipment requirements.

Q: Which industries benefit most from using the LaB6 sputtering target?
A: Industries such as microelectronics, optics, semiconductor fabrication, and surface engineering greatly benefit from its high purity and reliable sputter performance.

Q: How can I ensure the longevity of the sputtering target during use?
A: Proper handling, regular maintenance of the sputtering system, and adherence to recommended operating parameters can help maximise the lifespan and performance of the LaB6 sputtering target.