Discontinued (Discontinued) ST0301 Zirconium Boride (ZrB₂) Sputtering Target

Zirconium Diboride (ZrB₂) Sputtering Target Description

The sputtering target made from zirconium diboride (ZrB₂) is a high-performance material developed specifically for advanced thin film deposition processes. It is manufactured with high precision and offers excellent high-temperature stability and low thermal expansion, making it suitable for semiconductor and optical applications. The target provides a consistent sputter performance, ensuring uniform film deposition and improved reliability of components. Furthermore, its strong mechanical properties enable reliable operation under extreme conditions, meeting the stringent requirements of modern industrial applications.

Zirconium Diboride (ZrB₂) Sputtering Target Applications

- Thin film deposition: Ideal for semiconductor, microelectronics, and optical coating applications.
- Surface coatings: Used for producing wear-resistant, high-quality coatings for precision components.
- High-performance ceramics: Applied in high-temperature environments that require stable and durable materials.
- Research and development: Suitable for materials science investigations and experimental sputtering processes.
- Microelectronics: Appropriate for the deposition processes involved in the manufacture of integrated circuits.

Zirconium Diboride (ZrB₂) Sputtering Target Packing

Our zirconium diboride (ZrB₂) sputtering target is carefully packaged to maintain its quality during storage and transportation. Each target is sealed in a protective gas packaging to prevent oxidation and contamination. The packaging can be customised for both individual and bulk shipments.

Frequently Asked Questions

Q: What are the advantages of using zirconium diboride in sputtering targets?
A: Zirconium diboride offers high thermal stability, robust mechanical strength, and consistent sputter performance, making it ideal for advanced thin film deposition processes.

Q: Can the sputtering target be customised in size?
A: Yes, our zirconium diboride sputtering targets are available in customised sizes to meet specific application requirements.

Q: Which sputtering methods are compatible with this target?
A: This target is compatible with RF, RF-R, and DC sputtering methods.

Q: What is the benefit of the high melting point for the sputtering process?
A: The high melting point ensures dimensional stability and a longer lifespan of the target during high-energy sputtering applications, contributing to consistent film quality.

Q: In which industries are zirconium diboride sputtering targets typically used?
A: Industries such as semiconductor manufacturing, optics, microelectronics, and high-performance ceramics frequently use zirconium diboride sputtering targets due to their superior performance and reliability.