Discontinued (Discontinued) ST0308 Germanium Selenide (GeSe2) Sputtering Target

Germanium Selenide (GeSe2) Sputtering Target Description

The Germanium Selenide (GeSe2) sputtering target is a high-purity material designed for advanced sputtering deposition processes. With a composition of GeSe₂ and a melting point of 707℃, this target is optimised for semiconductor and thin film applications where precision and performance are critical. Its customisable shapes, available as standard discs or tailored configurations, ensure compatibility with a variety of sputtering systems and manufacturing requirements.

Germanium Selenide (GeSe2) Sputtering Target Applications

- Semiconductor Manufacturing: Ideal for the deposition of thin films in integrated circuits and other semiconductor devices.
- Optoelectronic Devices: Suitable for the fabrication of infrared optics and photodetectors.
- Solar Cells: Enhances photovoltaic performance through uniform layer deposition.
- Research and Development: Supports advanced material studies and experimental thin film processes.

Germanium Selenide (GeSe2) Sputtering Target Packing

Our germanium selenide sputter targets are carefully packaged to maintain product integrity during storage and transportation. Custom packaging solutions, such as vacuum-sealed containers, are available to protect the target from contamination and ensure optimal performance.

Frequently Asked Questions

Q: What applications is the Germanium Selenide (GeSe2) sputtering target best suited for?
A: It is primarily used in semiconductor manufacturing, for optoelectronic devices, solar cells, and in research and development for advanced thin film deposition processes.

Q: Why is high purity (≥99%) important for this sputtering target?
A: A high level of purity minimises contamination during deposition and ensures excellent film quality and consistent device performance.

Q: Can the target be customised beyond standard disc shapes?
A: Yes, the target is available in custom shapes to meet specific device or application requirements.

Q: What impact does the melting point of 707℃ have on its use?
A: A melting point of 707℃ ensures that the target maintains its structural integrity during high-temperature sputter processes, thereby enabling stable and reliable deposition.

Q: What does "Sputter: N/A" mean in the product information?
A: It means that no specific sputter method is assigned to this target, indicating it is designed for direct use in sputtering deposition processes without additional modifications.