ST0311 Molybdenum Selenide (MoSe2) Sputtering Target

Molybdenum Diselenide (MoSe2) Sputtering Target Description

The Molybdenum Diselenide (MoSe₂) sputtering target is manufactured with precision to ensure outstanding material performance in various high-tech applications. This target is designed for use in sputtering systems with RF, RF-R, and DC power supplies, ensuring reliable and uniform deposition of thin films. Its high purity and controlled composition guarantee excellent consistency and reproducibility, making it an optimal choice in semiconductor manufacturing and the coatings industry. Customised options for the target allow versatile adaptation to various production systems, thereby supporting the continuous advancement of microelectronics and photovoltaic technologies.

Molybdenum Diselenide (MoSe2) Sputtering Target Applications

- Thin film deposition: Used in the production of semiconductors, photovoltaic cells, and microelectronic devices.
- Surface coatings: Applied in coating technologies to enhance wear resistance and surface properties.
- Advanced electronics: Utilised in the fabrication of complex electronic components requiring high stability and uniformity.
- Research and development: Ideal for academic and industrial R&D projects exploring new material properties.

Molybdenum Diselenide (MoSe2) Sputtering Target Packing

Our Molybdenum Diselenide (MoSe₂) sputtering targets are carefully packaged to ensure optimal protection and quality maintenance during transport. Custom packaging options are available to meet various logistical requirements and ensure that each plate remains in flawless condition until installation.

Frequently Asked Questions

Q: For which applications are MoSe₂ sputtering targets commonly used?
A: They are commonly used for thin film deposition for semiconductors, photovoltaic cells, modern electronics, and surface coatings.

Q: Which sputtering methods are compatible with this target?
A: This target is compatible with RF, RF-R, and DC sputtering systems.

Q: How can I request a customised sputtering target?
A: Custom sizes and shapes are available; please contact our sales team with your specific requirements.

Q: What is the significance of the high purity (≥99%) of the target?
A: High purity ensures consistent sputtering performance and minimises contamination during the deposition process.

Q: How should the sputtering target be stored prior to use?
A: It should be stored in a clean, dry environment and handled carefully to maintain its surface integrity and performance quality.