Discontinued (Discontinued) ST0341 Gadolinium Zirconate (Gd2Zr2O7) Sputtering Target

Gadolinium Zirconate (Gd2Zr2O7) Sputtering Target Description

The Gadolinium Zirconate (Gd₂Zr₂O₇) sputtering target is a high-performance ceramic material specifically developed for advanced sputtering applications. Its exceptional chemical composition offers remarkable stability at elevated temperatures, making it an ideal candidate for thin film deposition processes. This target is manufactured with a purity of ≥99% and provides consistent quality and excellent performance. The product is available as standard discs or as customised targets tailored to meet the diverse requirements of industrial applications.

Gadolinium Zirconate (Gd2Zr2O7) Sputtering Target Applications

- Thin Film Deposition: Optimal for semiconductor fabrication, optical coatings, and sputtering processes in research.
- High-Temperature Coatings: Provides protection in extreme thermal environments.
- Ceramic Engineering: For applications requiring materials with high melting points and structurally stable properties.
- Research and Development: Ideal for experimental studies and innovations in modern materials science.

Gadolinium Zirconate (Gd2Zr2O7) Sputtering Target Packing

Our Gadolinium Zirconate sputtering targets are carefully packaged to ensure their integrity during storage and transportation. Custom packaging options are available to meet the specific handling and shipping requirements of our clients.

Frequently Asked Questions

Q: What are the main applications of the Gadolinium Zirconate sputtering target?
A: It finds wide application in thin film deposition for semiconductor devices, optical coatings, high-temperature protective layers, and various research applications.

Q: How is the high purity (≥99%) of the sputtering target ensured?
A: Our manufacturing process includes strict quality controls and advanced ceramic synthesis techniques to guarantee consistently high purity and performance.

Q: Can I request a customised shape or size for the sputtering target?
A: Yes, in addition to our standard disc shape, we also offer customised targets perfectly tailored to specific industrial requirements.

Q: For what sputtering processes is this target suitable?
A: Although the target is developed for advanced sputtering applications, it operates best when used with the deposition techniques specified in your sputter system guidelines.

Q: What should be considered when storing and handling these targets?
A: It is recommended to store the targets in a clean, dry environment and handle them carefully to maintain their structural integrity and high-performance characteristics.