ST0400 Rotatory Copper (Cu) Sputtering Target

Copper (Cu) Sputtering Target Description

The rotating Copper (Cu) Sputtering Target has been meticulously designed for demanding sputtering applications. Manufactured under stringent quality controls, this target offers excellent purity and predictable performance, which are essential for high-precision thin film deposition processes. Its rotating design ensures uniform erosion during sputtering, resulting in stable and reproducible outcomes. This target is suitable for semiconductor manufacturing, optical coatings, and other advanced materials, meeting the strict requirements of modern industrial production.

Copper (Cu) Sputtering Target Applications

- Semiconductor manufacturing: Essential for the deposition of conductive copper layers in integrated circuits and microelectronic devices.
- Optical coatings: For the production of reflective and transparent coatings in photonic devices.
- Thin film deposition: Provides uniform layers for sensors, solar cells, and displays.
- Surface technology: Ideal for enhancing wear resistance and conductivity of industrial components.

Copper (Cu) Sputtering Target Packing

Our rotating Copper (Cu) Sputtering Target is carefully packaged to ensure its integrity during shipping and storage.
- Custom packaging options available
- Typically delivered in vacuum-sealed containers to ensure product quality and durability.

Frequently Asked Questions

Q: What is a sputtering target used for?
A: A sputtering target is used in Physical Vapor Deposition (PVD) processes to apply thin films onto substrates for various electronic, optical, and industrial applications.

Q: Why is the purity level of a copper sputtering target important?
A: A high purity level ensures consistent deposition quality, minimizes contamination, and enhances the performance of the produced thin films.

Q: Can the target be customised for specific applications?
A: Yes, the target is available in custom sizes and shapes to meet the specific requirements of different sputter systems and applications.

Q: What advantages does the rotating design offer for the sputtering process?
A: The rotating design promotes uniform erosion of the target, leading to consistent deposition rates and improved homogeneity of the films.

Q: In which industries are copper sputtering targets typically used?
A: Industries such as semiconductor manufacturing, optical coating, and surface technology frequently use copper sputtering targets due to their reliable performance and high-quality deposition results.