ST0401 Rotatory Molybdenum (Mo) Sputtering Target

Rotating Molybdenum (Mo) Sputtering Target Description

The rotating Molybdenum (Mo) sputtering target is designed for critical applications where precision and performance are essential. This target is manufactured under exceptional quality control standards, providing uniform sputtering properties that ensure high-quality thin film deposition. Its excellent thermal stability and wear resistance make it a vital component of advanced sputtering systems employed in the semiconductor, optics, and renewable energy industries.

Applications for Rotating Molybdenum (Mo) Sputtering Targets

- Semiconductor manufacturing: Facilitates uniform deposition of thin films for integrated circuits and microelectronic components.
- Thin film deposition: Ideal for modern coatings in solar cells, optical devices, and displays.
- Surface engineering: Enhances surface properties such as hardness and wear resistance of industrial components.
- Research and development: Serves as a reliable material for developing new sputtering techniques and advanced material studies.

Rotating Molybdenum (Mo) Sputtering Target Packing

Our rotating Molybdenum (Mo) sputtering target is securely packed in custom containers to ensure product integrity during storage and transport. Packaging options include vacuum-sealed packaging and robust, tailored containers that meet specific customer requirements.

Frequently Asked Questions

Q: What is the significance of the rotating design in this sputtering target?
A: The rotating design ensures uniform deposition of thin films by providing consistent sputtering across the entire target surface.

Q: How is the purity level of ≥99% maintained?
A: Advanced refining techniques and strict quality control procedures are employed throughout the manufacturing process to ensure a high purity level.

Q: In which industries can this Molybdenum sputtering target be used?
A: It is suitable for semiconductor manufacturing, thin film deposition in solar cells and optical devices, as well as other industrial high-performance applications.

Q: Can the shape of the sputtering target be customised?
A: Yes, in addition to the standard rotating shape, the target can be custom manufactured to meet specific dimensions and design requirements.

Q: What benefits do the Indium and elastomer bonds provide?
A: These bonds offer excellent thermal conductivity and stability during the sputtering process, ensuring optimal performance and durability of the target.