ST0412 Aluminum-doped Zinc Oxide (AZO) Sputtering Target

Aluminum-doped Zinc Oxide (AZO) Sputtering Target Description

The Aluminum-doped Zinc Oxide (AZO) Sputtering Target is engineered for precision and reliability in advanced thin film deposition processes. Manufactured to a high purity of ≥99%, this target features a composition of ZnO:Al₂O₃ to deliver improved electrical conductivity and optical transparency necessary for high-performance applications. The target is available in standardized disc shapes or can be custom-made to meet specific application requirements. It is ideally suited for industries that demand superior material performance in semiconductor fabrication, display technologies, and photovoltaic systems.

Aluminum-doped Zinc Oxide (AZO) Sputtering Target Applications

· Thin Film Deposition: Perfect for fabricating high-quality thin films in semiconductor and display panel manufacturing.
· Photovoltaics: Used in the production of transparent conductive oxides for solar cell applications.
· Electronic Devices: Provides enhanced performance in optoelectronic devices due to its refined electrical and optical properties.
· Coating Processes: Ideal for sputtering processes in various industrial coating applications.

Aluminum-doped Zinc Oxide (AZO) Sputtering Target Packing

Our Aluminum-doped Zinc Oxide (AZO) Sputtering Target is carefully packaged to maintain its high purity and structural integrity during transit. Custom packaging options are available to meet specific shipping and handling requirements.

Frequently Asked Questions

Q: What are the primary applications of the AZO sputtering target?
A: It is primarily used in thin film deposition processes for the semiconductor, display, and photovoltaic industries.

Q: How does the ZnO:Al₂O₃ composition benefit the sputtering process?
A: The ZnO:Al₂O₃ composition enhances electrical conductivity and optical transparency, which are critical for high-performance thin film applications.

Q: In what forms is the AZO sputtering target available?
A: The target is available as standard discs or can be custom-made to suit specific manufacturing requirements.

Q: Why is a purity level of ≥99% important for this product?
A: High purity ensures consistent performance and minimizes defects during the sputtering process, leading to superior film quality.

Q: Can the packaging for the AZO sputtering target be customized?
A: Yes, packaging can be customized to ensure optimal protection and compliance with shipping requirements.