ST0420 Osmium (Os) Sputtering Target

Osmium (Os) Sputtering Target Description

The Osmium (Os) Sputtering Target has been developed for advanced sputter systems and is characterised by excellent performance and high purity (≥99%). Manufactured with exceptional precision, this target provides the stability and consistency required for high-precision thin film deposition and surface coating applications. Its configurable shapes, including discs and specially designed configurations, allow it to meet various application requirements. The excellent physical properties, such as a melting point of 3033℃ and high density (22.59 g/cm³), make it an ideal choice for industry and research.

Osmium (Os) Sputtering Target Applications

- Semiconductor thin film deposition: Essential for the production of integrated circuits and microelectronic devices.
- Microelectronics: Enables the fabrication of precise layers required for advanced electronic components.
- Research and Development: Provides a reliable material platform for advanced experiments and prototype development.
- Coatings: Suitable for high-performance applications including thermal coatings and surface modifications under extreme conditions.

Osmium (Os) Sputtering Target Packing

Our Osmium (Os) Sputtering Targets are securely packaged to maintain their high purity and structural integrity during storage and transport. They are available in standard discs or in custom configurations based on your specific requirements, ensuring minimal handling impact and maximum protection during delivery.

Frequently Asked Questions

Q: What is the purity level of the Osmium (Os) Sputtering Target?
A: The target is produced with a purity of ≥99%.

Q: What shapes are available for the Osmium (Os) Sputtering Target?
A: The product is available in disc form or can be manufactured according to your specifications.

Q: What is the melting point of the osmium used in this product?
A: The melting point of osmium in this target is 3033℃.

Q: How is the Osmium (Os) Sputtering Target packaged?
A: It is securely packaged to preserve its high purity and structural integrity, and is available in standard disc form or in custom configurations as needed.

Q: Which industries is the Osmium (Os) Sputtering Target suitable for?
A: It is ideal for semiconductor thin film deposition, microelectronics, advanced research, and high-performance coating applications.