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  • ST0441 Lanthanum Barium Manganate Sputtering Target

    • ST0441 Lanthanum Barium Manganate Sputtering Target

    Catalogue Number ST0441
    Composition La(1-x)BaxMnO3
    CAS Number N/A
    Purity ≥99%
    Shape Discs, or Custom-made

    The Lanthanum-Barium-Manganese Sputter Target is recognised for its precision engineering and outstanding performance in advanced thin film deposition processes. Stanford Advanced Materials continues to lead the industry with innovative sputter target solutions that ensure exceptional quality and reliable results for high-tech applications.

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    LAST RECOMMENDATION

    ST0008 Cerium (Ce) Sputtering Target
    ST0013 Erbium (Er) Sputtering Target
    ST0014 Europium (Eu) Sputtering Target
    ST0020 Holmium (Ho) Sputtering Target
    ST0024 Lanthanum (La) Sputtering Target
    ST0028 Magnesium (Mg) Sputtering Target
    ST0030 Molybdenum Sputter Targets, Mo
    ST0031 Neodymium (Nd) Sputtering Target
    ST0033 Niobium (Nb) Sputtering Target

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

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      Thickness

      0.25''

      • 0.25''
      • 0.125''
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      Bonding

      Yes

      • Yes
      • No
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