ST0448 Lanthanum Strontium Chromate (La(1-x)SrxCrO3) Sputtering Target

Lanthanum-Strontium-Chromate Sputtering Target Description

The Lanthanum-Strontium-Chromate sputtering target is designed for advanced sputtering applications that require precision and consistency. Its innovative composition of La(1-x)SrxCrO3 delivers excellent performance in coating processes, ensuring superior adhesion and uniform film deposition. The target is available in standard disc forms and custom shapes to meet specific technical requirements. With bonding options including Indium and elastomer, this sputtering target guarantees enhanced durability and process stability for various industrial applications.

Lanthanum-Strontium-Chromate Sputtering Target Applications

- Thin film deposition: Suitable for semiconductor devices, display panels, and photovoltaic cells.
- Surface coatings: Used for producing decorative, protective, or functional coatings on various substrates.
- Electronics manufacturing: Ensures reliable film formation in electronic components that require precise conductive and insulating layers.
- Advanced research: Applied in laboratories for materials science research and development.

Lanthanum-Strontium-Chromate Sputtering Target Packaging

The Lanthanum-Strontium-Chromate sputtering target is carefully packaged to ensure its quality and integrity. It is securely wrapped and packed according to customer specifications to guarantee safe transport and storage until it reaches its destination.

Frequently Asked Questions

Q: For which applications are sputtering targets best suited?
A: Sputtering targets are commonly used for thin film deposition in semiconductor manufacturing, display production, photovoltaic cells, and specialised protective coatings.

Q: What advantages does the composition of La(1-x)SrxCrO3 offer for the sputtering process?
A: This composition promotes stable film deposition, improved adhesion, and uniformity, which are critical for high-performance coating applications.

Q: Are custom shapes available for the sputtering target?
A: Yes, the target is available in both standard disc forms and custom shapes to meet specific technical demands.

Q: What does a purity grade of ≥99% mean?
A: A purity grade of ≥99% ensures minimal impurities, leading to more uniform and reliable performance during the sputtering process.

Q: What types of bonds are used in this target, and why are they important?
A: The target employs Indium and elastomer bonds that are essential for secure attachment during sputtering and for improving overall process stability.