ST0473 Titanium Ferrite (TiFe2O4) Sputtering Target

Titanium Ferrite (TiFe2O4) Sputtering Target Description

The sputtering target made from titanium ferrite (TiFe2O4) is developed for high-quality thin film deposition and advanced coating applications. The material, manufactured with a purity of ≥99%, features a stable composition and is ideal for the production of electronic components, magnetic storage devices, and sensor applications. Its customisable shapes and precise production techniques ensure excellent performance and reliability under demanding industrial conditions. This sputtering target is particularly suitable for applications requiring enhanced durability and uniform film quality.

Titanium Ferrite (TiFe2O4) Sputtering Target Applications

- Thin film deposition: Ideal for producing uniform coatings in semiconductor, microelectronics, and sensor applications.
- Electronic components: Used for the manufacturing of magnetic storage devices and modern circuit components.
- Modern coatings: Suitable for protective and functional coatings in high-tech industries.
- Research and development: Essential for experimental setups in materials science and applied physics.
- Custom industrial solutions: Tailored sputtering targets for specific manufacturing requirements.

Titanium Ferrite (TiFe2O4) Sputtering Target Packaging

Our titanium ferrite sputtering targets are carefully packaged to maintain their pristine condition throughout transport. Custom packaging options are available to ensure safe handling. Standard batch sizes can also be provided upon request to meet various manufacturing needs.

Frequently Asked Questions

Q: What benefits does the use of a titanium ferrite sputtering target offer?
A: It provides excellent film uniformity, improved coating durability, and high purity, making it ideal for modern electronics and thin film applications.

Q: How does the customisable shape impact the sputtering process?
A: The customisable shape allows adaptation to specific deposition systems and processes, ensuring optimal target utilisation and efficiency.

Q: Can the target be used in reactive sputtering processes?
A: Yes, due to its stable composition and tailored design, it is suitable for various sputtering methods, including reactive sputtering, to achieve the desired film properties.

Q: In which industries are titanium ferrite sputtering targets typically used?
A: They are commonly employed in semiconductor manufacturing, magnetic storage devices, modern coating applications, and research laboratories.

Q: How is the quality and consistency of the sputtering targets ensured?
A: Our strict quality control procedures, combined with advanced manufacturing techniques, guarantee uniformity, high purity, and reliable performance in every production batch.