ST0480 Potassium (K) Sputtering Target

Potassium (K) Sputtering Target Description

The Potassium (K) Sputtering Target is designed for precision and reliability in sputtering coating processes. This target is produced under stringent quality controls, ensuring uniform evaporation and consistent layer quality on all substrates. Its high purity and special bonding method guarantee excellent performance in producing high-quality thin films. This target is suitable for a range of advanced industrial applications, meeting the requirements of modern microelectronics, optical coatings, and research laboratories.

Potassium (K) Sputtering Target Applications

- Thin Film Deposition: Essential for producing uniform coatings in the semiconductor and electronics industries.
- Microelectronics: Used in the manufacture of integrated circuits and other microcomponents.
- Display Technologies: Ideal for the deposition of thin films in modern display and sensor applications.
- Research Laboratories: Provides reliable performance for experimental sputtering applications.
- Custom Coatings: Suitable for specialised applications requiring tailored sputtering processes.

Potassium (K) Sputtering Target Packing

The Potassium (K) Sputtering Target is securely packaged to maintain its integrity and purity during storage and transport. Packaging is carried out under specialised inert conditions to protect the reactive material from air and moisture exposure. Custom packaging options are available to meet specific application requirements.

Frequently Asked Questions

Q: What special precautions are required when handling the Potassium (K) Sputtering Target?
A: Due to its high reactivity with air and moisture, it should be handled and stored under inert conditions, typically in an oil or controlled environment.

Q: How is the Potassium (K) Sputtering Target manufactured?
A: It is manufactured under strict quality controls to ensure high purity and precision, offering options in the form of standard discs or customised designs depending on application requirements.

Q: Can this target be used for semiconductor thin film deposition?
A: Yes, the target is ideal for thin film deposition in semiconductor devices, providing uniform and high-quality coatings.

Q: What does the information on "Type of Bonding" indicate?
A: It specifies the bonding method where indium and elastomer are used to securely attach the target to the backing plate and ensure effective heat dissipation during sputtering.

Q: Are custom sizes available for the Potassium (K) Sputtering Target?
A: Yes, the product is available in custom sizes to meet specific application requirements.