Discontinued (Discontinued) ST0496 Germanium Silicon (Ge/Si) Sputtering Target

Germanium-Silicon (Ge/Si) Sputtering Target Description

The Germanium-Silicon (Ge/Si) Sputtering Target utilises advanced manufacturing techniques to achieve exceptional uniformity and purity. This target is specifically designed for sputtering applications and delivers high performance in thin-film deposition processes. Its unique composition (Ge/Si) ensures reliable operation in demanding semiconductor and electronics manufacturing environments. The material's compatibility with both Indium and elastomeric bonding allows for adaptation to various custom configurations, making it an ideal choice for both experimental and high-throughput production setups.

Germanium-Silicon (Ge/Si) Sputtering Target Applications

- Thin-film deposition: Essential for producing high-quality films in semiconductors and optoelectronic devices.
- Semiconductor manufacturing: Used in the production of integrated circuits and modern microelectronic components.
- Photovoltaic devices: Facilitates the deposition of precise thin films for efficient solar cell production.
- MEMS manufacturing: Suitable for microelectromechanical systems where material consistency and precision are critical.

Germanium-Silicon (Ge/Si) Sputter Target Packaging

Our sputter targets are handled with utmost care during packaging and transportation. Each unit is packaged in a cleanroom environment to ensure it remains free from contamination, preserving its pristine condition. We offer custom packaging options to meet specific customer requirements.

Frequently Asked Questions

Q: What are the main benefits of using a Ge/Si sputter target?
A: Ge/Si sputter targets provide excellent purity and compatibility with advanced thin-film deposition processes, ensuring consistently high quality for electronic applications.

Q: Can the shapes of the sputter targets be customised?
A: Yes, the targets can be manufactured in standard disc form or customised according to your specific application requirements.

Q: In which industries are Ge/Si sputter targets typically used?
A: These targets are primarily employed in semiconductor manufacturing, photovoltaic device production, MEMS manufacturing, and modern electronics research.

Q: How is the quality and purity of the sputter targets ensured?
A: Our production process adheres to stringent quality control standards, and each target is manufactured under controlled conditions to guarantee a purity level of ≥99%.

Q: Are there specific storage requirements for Ge/Si sputter targets?
A: It is recommended to store the targets in a clean, dry environment where they are exposed to minimal contamination to maintain their integrity until installation.