ST0503 Platinum Ruthenium (Pt/Ru) Sputtering Target

Platinum Ruthenium (Pt/Ru) Sputtering Target Description

The Platinum Ruthenium (Pt/Ru) Sputtering Target manufactured by Stanford Advanced Materials is engineered for high performance in modern deposition technologies. Utilizing state-of-the-art manufacturing processes, this product offers excellent purity and customizable forms that meet the demanding requirements of advanced industrial applications. Its superior properties ensure reliable sputtering performance and uniform film deposition, making it an ideal choice for research, development, and production in high-tech industries.

Platinum Ruthenium (Pt/Ru) Sputtering Target Applications

· Microelectronics: Essential for depositing high-quality thin films in integrated circuits and sensors.
· Flat Panel Displays: Provides uniform coatings crucial for advanced display technology.
· Solar Cells: Used in the formation of electrodes for efficient thin-film solar cells.
· Research and Development: Ideal for experimental setups in materials science and nanotechnology.

Platinum Ruthenium (Pt/Ru) Sputtering Target Packing

Our Platinum Ruthenium (Pt/Ru) Sputtering Target is carefully handled and packaged to maintain its exceptional quality. Individual units are vacuum-sealed and packed in custom-made containers designed to meet specific customer requirements, ensuring safe storage and transportation.

Frequently Asked Questions

Q: What are the main advantages of using a Pt/Ru sputtering target?
A: The Pt/Ru sputtering target offers high purity and exceptional performance, providing superior film adhesion, uniform deposition, and enhanced electrical conductivity in various applications.

Q: Can the shape of the sputtering target be customized?
A: Yes, the Pt/Ru sputtering target is available in standard disc shapes or can be custom-made to meet specific design and application needs.

Q: What industries commonly use the Pt/Ru sputtering target?
A: It is widely used in microelectronics, flat panel displays, solar cells, and various research and development applications where precise thin-film deposition is required.

Q: How does the bonding type affect the performance of the sputtering target?
A: The use of Indium and Elastomer bonding ensures excellent thermal and mechanical stability, which enhances the target’s performance during the sputtering process.

Q: What quality standards are maintained in the production of this sputtering target?
A: The product is manufactured under strict quality control measures, ensuring a purity of ≥99% and adherence to industry standards for high-performance sputtering targets.