Discontinued (Discontinued) ST0890 Niobium Titanium Sputtering Target, Nb/Ti

Niobium-Titanium-Sputtering-Target Description

The Niobium-Titanium sputtering target, Nb/Ti, is produced with a high purity of ≥99% and is available in the form of discs or customised shapes to meet various industrial requirements. It is manufactured using advanced production techniques and is designed to provide excellent performance in precision thin film deposition processes. This target is ideal for the production of semiconductor devices, sensors, and other electronic components. Its special design ensures excellent adhesion and uniform layer growth, making it a reliable choice for both research and mass production.

Applications for Niobium-Titanium Sputtering Targets

- Thin Film Deposition: Suitable for the deposition of uniform, high-quality layers in semiconductor manufacturing and microelectronic applications.
- Sensor Production: Ideal for the fabrication of thin films that enhance the performance and sensitivity of various sensor devices.
- Solar Cells: Useful for the production of efficient thin-film solar cells.
- Coating Technologies: Appropriate for advanced coating processes in optics and for decorative applications.
- Research and Development: Widely used in laboratories for the development and prototyping of new materials and processes.

Niobium-Titanium Sputtering Target Packaging

Our Niobium-Titanium sputtering target, Nb/Ti, is securely packaged in vacuum-sealed containers to ensure its purity and integrity during storage and transportation. The products are available in custom sizes to optimally meet the specific requirements of your applications.

Frequently Asked Questions

Q: In which industries is the Niobium-Titanium sputtering target typically used?
A: It is commonly used in semiconductor manufacturing, sensor production, thin film deposition for solar cells, and in advanced coating technologies.

Q: What advantages does the high purity (≥99%) of the Nb/Ti target offer for the sputtering process?
A: The high purity ensures minimal contamination during layer deposition, leading to improved layer uniformity and performance in critical electronic applications.

Q: Can the shape of the target be customised for specific sputtering systems?
A: Yes, the target is available in the form of a disc or can be custom-made to suit specific systems or application requirements.

Q: What measures are taken to ensure the integrity of the sputtering target during delivery?
A: The target is vacuum-sealed in protective packaging to maintain its purity and prevent contamination during storage and transport.

Q: Is technical support available for selecting the right target configuration for my application?
A: Yes, our technical support team assists you in selecting and customising the sputtering target configuration that best meets your process requirements.