ST0974 Manganese-Iron Oxide Sputtering Target, MnFe2O4

Manganese-Iron Oxide Sputtering Target Description

The manganese-iron oxide sputtering target, MnFe2O4, is manufactured with high purity (≥99%) and is available in customizable shapes, including discs or bespoke forms. It has been developed for precise sputtering applications, maintaining stable performance even at high temperatures (>300 °C) and serves as a reliable solution for various industrial coating and electronics manufacturing processes.

Applications for Manganese-Iron Oxide Sputtering Targets

- Semiconductor manufacturing: Used for thin film deposition in integrated circuits and display technologies.
- Coating processes: Ideal for surface coating applications requiring high durability and chemical stability.
- Advanced electronics: Suitable for formulations that require high purity and precise deposition.
- Research and development: Utilised in experimental setups for the development of new materials and sputtering processes.

Manganese-Iron Oxide Sputtering Target Packaging

Our manganese-iron oxide sputtering targets are securely packaged to maintain optimal condition during storage and transport. Packaging options include protective packaging for discs as well as customised solutions tailored to customer specifications.

Frequently Asked Questions

Q: What are sputter targets used for?
A: Sputter targets are used in the physical vapour deposition process to create thin layers on substrates for applications such as semiconductors, displays, and coatings.

Q: How is the purity of the sputter target verified?
A: Purity is verified using advanced analytical methods such as mass spectrometry and X-ray fluorescence to ensure compliance with strict standards.

Q: Can the shapes of sputter targets be customised?
A: Yes, sputter targets can be custom-manufactured to provide flexibility in meeting specific design and functional requirements.

Q: What operating temperature can this sputter target withstand?
A: This product is designed for operation at temperatures above 300 °C, ensuring stable performance in high temperature applications.

Q: How does this product differ from other sputter targets?
A: Our product offers superior purity and performance, making it an ideal choice for advanced industrial applications, research and development, and precise coating processes.