ST0991 Strontium Iron Oxide Sputtering Target, SrFe12O19

Strontium-Iron-Oxide Sputter Target Description

The Strontium-Iron-Oxide Sputter Target SrFe12O19 has been developed to meet the high standards required for modern sputtering applications. This target is manufactured with an exceptional purity (≥99%) and ensures consistent performance and reliable operation in processes such as thin film deposition. Its high melting point of 450 °C and a density of 8.02 g/cm³ contribute to its suitability for environments requiring precise thermal management and structural integrity. Designed for versatility, the target is available as a standard disc or can be customised to meet specific customer specifications, ensuring optimal compatibility with various sputter systems.

Strontium-Iron-Oxide Sputter Targets Applications

- Thin Film Deposition: Ideal for producing uniform metallic, magnetic, or insulating thin films in semiconductor and microelectronic processes.
- Microelectronics: Used in the fabrication of integrated circuits where precision and reliability are crucial.
- Optoelectronic Devices: Supports the development of displays, sensors, and photovoltaic cells through consistent material properties.
- Research and Development: Suitable for experimental sputtering applications where material performance and reproducibility are essential.

Strontium-Iron-Oxide Sputter Target Packaging

The sputter targets are securely packaged to ensure their quality and integrity during storage and transportation. Standard packaging includes protective containers designed to minimise contamination and mechanical damage. Custom packaging solutions are also available to meet specific customer requirements.

Frequently Asked Questions

Q: What is the exact composition of the sputter target?
A: The composition is SrFe₁₂O₁₉.

Q: What forms are available for this product?
A: The product is available in the form of discs or can be custom made to meet specific requirements.

Q: What is the purity level of the sputter target?
A: The purity level is ≥99%.

Q: What does the melting point of 450 °C indicate for its applications?
A: The melting point indicates excellent thermal stability, making it ideally suited for high-temperature sputtering processes.

Q: How is the sputter target packaged?
A: The targets are packaged in secure protective containers, with custom packaging options available according to customer preferences.