Discontinued (Discontinued) ST0994 Titanium Silicon Sputtering Target, Ti-Si

Titanium-Silicon Sputtering Target Description

The Titanium-Silicon Sputtering Target, Ti-Si, has been developed to meet the precise requirements of sputter applications. Manufactured with a purity of ≥99% and available in standard disc formats as well as customised shapes, this target ensures exceptional performance and consistency during the sputter process. Its optimised composition provides stable deposition rates and high consistency for quality electronic, optical, and surface engineering applications.

Applications for Titanium-Silicon Sputtering Targets

- Semiconductor Manufacturing: Ideal for thin film deposition in microelectronics and for integrated circuits.
- Photovoltaic Cells: Used for layer deposition in the production of solar cells.
- MEMS Components: Suitable for the manufacture of microelectromechanical systems that require precise material performance.
- Optical Coatings: Appropriate for applications where controlled layer thickness and optical properties are critical.

Titanium-Silicon Sputter Target Packaging

Our Titanium-Silicon Sputter Targets are carefully packaged to maintain their pristine condition during transport. The targets are securely packaged to prevent contamination and damage. Custom packaging solutions are also available for specific logistical requirements.

Frequently Asked Questions

Q: What is the composition of the Titanium-Silicon Sputtering Target, Ti-Si?
A: It consists of a Titanium-Silicon alloy with a purity of ≥99%.

Q: For which applications is this sputtering target used?
A: It is employed in semiconductor manufacturing, thin film deposition, photovoltaics, and the production of MEMS devices.

Q: Are customised sizes available for the sputtering target?
A: Yes, the product is available in standard disc formats or can be custom-manufactured for specific requirements.

Q: What role does the indium bond play in this product?
A: The indium bond provides a reliable connection between the target material and the substrate, ensuring stability during the sputter process.

Q: How should the Titanium-Silicon Sputtering Target be stored and handled?
A: It should be stored in a clean, dry environment and handled carefully to maintain surface integrity and prevent contamination.