Discontinued (Discontinued) ST1005 Niobium-doped Titanium Dioxide Sputtering Target, TiO2-Nb

Niobium-Doped Titanium Dioxide Sputtering Target Description

The Niobium-Doped Titanium Dioxide Sputtering Target, TiO2-Nb, has been developed for exceptional layer deposition in various high-tech applications. The high purity (≥99%) and customizable shapes make it an ideal choice for critical processes in semiconductor manufacturing, solar cell production, and the production of optoelectronic devices.

Applications of Niobium-Doped Titanium Dioxide Sputtering Target

- Semiconductor Manufacturing: Excellent thin film deposition for integrated circuits and microelectronic devices.
- Photovoltaics: Enhances the production efficiency and performance of solar cells.
- Optoelectronics: Ideal for the production of optical coatings and display technologies.
- Research and Development: Suitable for experimental setups requiring high purity and stability.

Niobium-Doped Titanium Dioxide Sputtering Target Packaging

Our sputtering targets are carefully packaged to preserve their quality and integrity during transport. Each target is packaged in an antistatic protective wrap to prevent damage and ensure that the material arrives in optimal condition for application.

Frequently Asked Questions

Q: What advantages does the niobium doping of the TiO2 sputtering target provide?
A: The niobium doping improves the electrical and physical properties of TiO2, resulting in enhanced uniformity and stability of the film during the deposition process.

Q: How does the high purity level (≥99%) of this target affect its performance?
A: The high purity level ensures minimal contamination during layer deposition, which is critical for achieving precise and reliable thin film characteristics for demanding applications.

Q: For what types of applications can this sputtering target be used?
A: This target is ideal for semiconductor manufacturing, photovoltaic cells, optoelectronic devices, and research applications requiring high-quality thin films.

Q: Can the shape of the sputtering target be customized?
A: Yes, the targets are available in the form of discs or can be custom-made to meet specific design and performance requirements.

Q: What should be considered when storing and handling sputtering targets?
A: It is recommended to store the targets in a controlled environment using antistatic and protective packaging to avoid mechanical or electrostatic damage before use in the deposition process.