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CY3438 Pt-plated Silicon Wafer (Pt Coated SiO2/Si Substrate)

Catalogue Number CY3438
Composition Pt, Ti, SiO2, Si
Dimensions 4” Dia.
Thickness SiO2 500nm (N100), Pt 150mm, Ti 20nm

The Pt-coated SiO2/Si substrate can be utilised in the nanometre range, in Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and other scanning probe microscopy techniques. Stanford Advanced Materials (SAM) possesses extensive experience in the manufacturing and supply of high-quality optical products.

Related products: Aluminium film on silicon wafer, Au/Ti coated SiO2/Si substrate, Au/Cr coated SiO2/Si substrate, Ag-coated silicon wafers

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