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ST6545 Molybdenum Rotary Target

Catalogue Number ST6545
Material Mo
CAS Number 7439-98-7
Dimensions Customized
Purity ≥99.95% or 99.97%
Density ≥10.15 g/cm3
Form Target

Molybdenum Rotational Sputter Targets are high-performance materials designed for the deposition of thin films in large-scale coating applications. Stanford Advanced Materials (SAM) offers high-purity Molybdenum rotational sputter targets for thin film deposition in displays, solar cells, and optical coatings. These targets ensure uniform film quality, excellent conductivity, and long service life, with customizable options to meet various industrial requirements.

Other forms: Molybdenum Sputter Target, Planar Molybdenum (Mo) Sputtering Target

Related products: Molybdenum Rhenium Sputtering Target, Molybdenum Disilicide Sputtering Target, Molybdenum Silicon Sputtering Target, Molybdenum Selenide Sputtering Target, Molybdenum Boride Sputtering Target

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United Kingdom

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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