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ST6572 Nickel Platinum Target (NiPt Target)

Catalogue Number ST6572
Purity 99.9%, 99.95%
Shape Planar Disc
Element Symbol Ni, Pt
Melting Point 1400-1650 °C

Stanford Advanced Materials (SAM) offers high-purity sputter targets made from a nickel-platinum alloy (NiPt-Targets) designed for physical vapour deposition (PVD) in the semiconductor, optical coatings, and scientific research sectors. These targets combine the high electrical conductivity of Nickel with the corrosion resistance of Platinum and are available in custom sizes and purities (≥99.95%) for precise thin film deposition.

Related Products: Nickel Sputtering Target, Ni, Platinum Sputtering Target, Pt, Nickel-Cobalt Sputtering Target, Ni-Co, Platinum-Iridium Sputtering Target, Pt-Ir

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United Kingdom

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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