Discontinued (Discontinued) ST6586 Tantalum Tungsten Target (TaW Target)

Tantalum-Tungsten Target (TaW Target) Description

Tantalum-Tungsten Target (TaW Target) is a composite material for sputtering that combines the exceptional corrosion resistance of Tantalum with the high melting point and thermal conductivity of Tungsten. This alloy offers superior mechanical strength and stability under extreme conditions, making it ideal for high-temperature sputtering applications. Tantalum provides excellent resistance to chemical attacks, particularly in acidic and high-temperature environments, while Tungsten enhances the target's ability to withstand heat and mechanical stress. The combination of these two metals results in a target with outstanding durability, suitable for a variety of demanding thin film deposition processes. The material is characterised by excellent uniformity and consistency during sputtering, ensuring high-quality layer deposition with minimal particle contamination. TaW targets are commonly used in industries such as aerospace, electronics, and energy, where high performance and longevity are critical.

Tantalum-Tungsten Target (TaW Target) Specification

*The above product information is based on theoretical data. For specific requirements and detailed inquiries, please contact us.

Size: Custom

Tantalum-Tungsten Target (TaW Target) Applications

• Semi-conductor manufacturing: It is used for depositing thin films in semiconductor devices, particularly for creating durable barrier layers and conductive coatings where high corrosion resistance and high-temperature stability are required.
• Aerospace and defence: TaW targets are used in the manufacturing of coatings for aerospace components, such as turbine blades and engine parts, where both high-temperature resistance and mechanical strength are essential.
• Energy sector: The alloy is utilised in energy applications such as coating materials for high-performance components in nuclear reactors, as it withstands extreme environments and is corrosion-resistant.
• Optical coatings: Tantalum-Tungsten targets are used for depositing thin films for optical coatings, particularly in applications requiring durable high-performance materials.
• Modern electronics: TaW is used for manufacturing thin films in microelectronics and advanced electronic devices, providing conductive layers with excellent durability and resistance to wear and high temperatures.

Tantalum-Tungsten Target (TaW Target) Packaging

Our products are packaged in custom cartons of various sizes, tailored to the dimensions of the material. Small items are securely packaged in PP cartons, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging specifications and the use of appropriate cushioning materials to provide optimal protection during transport.

Packaging: Carton, wooden crate, or custom.

Manufacturing Process

1. Brief Overview of the Manufacturing Process

2. Testing Procedures

1. Chemical composition analysis - Verified with techniques such as GDMS or XRF to ensure compliance with purity requirements.
2. Mechanical property testing - Includes tests for tensile strength, yield strength, and elongation to assess material performance.
3. Dimensional verification - Measures thickness, width, and length to ensure compliance with specified tolerances.
4. Surface quality inspection - Checks for defects such as scratches, cracks, or inclusions through visual and ultrasonic examinations.
5. Hardness testing - Determines material hardness to confirm uniformity and mechanical reliability.

Frequently Asked Questions about Tantalum-Tungsten Targets (TaW Targets)

Q1: What are the main advantages of using TaW targets?

A1: TaW targets provide exceptional high-temperature stability, excellent corrosion resistance, and robust mechanical properties, making them ideal for use in demanding environments such as aerospace, semiconductor manufacturing, and energy applications.

Q2: Can I customise the size or shape of the TaW target?

A2: Yes, Stanford Advanced Materials offers customised TaW targets in various sizes and shapes to meet specific application requirements. Please contact us for custom options.

Q3: Which sputtering methods are compatible with TaW targets?

A3: TaW targets are compatible with both DC and RF sputtering methods and are suitable for high-performance sputtering systems that ensure uniform and high-quality deposition for thin film applications.

Performance Comparison Table with Competing Products

TaW Target vs. Ta Target vs. Nb Target

Related Information

1. Raw Materials - Tantalum (Ta)

Tantalum is a dense, corrosion-resistant refractory metal with atomic number 73 and an extremely high melting point of 3017°C. It is chemically inert, particularly towards acids, and forms a protective oxide layer that contributes to its exceptional corrosion resistance. Tantalum is highly ductile, biocompatible, and retains its strength even at high temperatures, making it valuable for applications in electronics, aerospace, and medicine. Its excellent capacitive properties also make it an important material for the manufacture of capacitors.

2. Raw Materials - Tungsten (W)

Tungsten, with atomic number 74, is one of the heaviest and most heat-resistant metals, possessing the highest melting point of all elements at 3422°C. It exhibits outstanding hardness, high density (19.3 g/cm³), and remarkable resistance to thermal and mechanical fatigue. Tungsten is frequently used in applications requiring extreme durability, such as cutting tools, high-temperature furnaces, and sputtering targets. Due to its excellent structural stability, it also contributes to radiation shielding and wear-resistant coatings.