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ST6587 Tantalum Niobium Target (TaNb Target)

Catalogue Number ST6587
Material Ta, Nb
Purity 99.95%
Shape Planar Disc

The Tantalum-Niobium Target (TaNb-Target) from Stanford Advanced Materials is a durable and high-performance sputtering material that combines the corrosion resistance and high melting point of Tantalum with the strength and superconducting properties of Niobium. It is suitable for advanced thin film deposition in electronics and aerospace applications.

Related products: Tantalum Sputtering Target, Ta, Tantalum-Aluminium Sputtering Target, Ta/Al, Niobium Sputtering Target, Nb, Lithium Niobate Sputtering Target, LiNbO3

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United Kingdom

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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