Thorium Fluoride Vapour Deposition Materials Description
Thorium tetrafluoride (ThF4) is a fluoride‐ceramic vapour deposition material offered by Stanford Advanced Materials. The compound with the chemical formula ThF4 is used in vapour deposition processes and produces deposition layers that meet industry standards. SAM produces vapour deposition materials with purities up to 99.9995%. Quality control protocols ensure product reliability.
Thorium Fluoride Vapour Deposition Materials Specification
Specification |
Description |
Material Type |
Thorium tetrafluoride |
Symbol |
ThF4 |
Appearance/Colour |
White Crystal |
Melting Point |
1 110 °C (2 030 °F; 1 380 K) |
Density |
6.3 g/cm³ |
Purity |
99.9% ~ 99.99% |
Form |
Powder/Granulate/Custom-made |
Thorium Fluoride Vapour Deposition Materials Application
Thorium tetrafluoride vapour deposition materials are used in several deposition processes, including:
- Deposition of semiconductors
- Chemical vapour deposition (CVD)
- Physical vapour deposition (PVD)
- Optical applications
- Wear protection
- Decorative coatings
- Displays
Thorium Fluoride Vapour Deposition Materials - Packaging
To ensure proper identification and quality control, the Thorium tetrafluoride vapour deposition materials are carefully labelled and externally tagged. Strict measures prevent damage during storage or transport, thereby preserving product integrity.