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WM3862 Tungsten Diselenide CVD Film (WSe2)

Catalogue Number WM3862
Material SiO2/Si, silicon wafer, PET, PI, ITO, FTO, glass.
Dimensions 10*10, 15*15, 20*20 mm, or customized
Method of Manufacturing Chemical Vapor Deposition (CVD)

We offer Tungsten Diselenide-CVD Films on various substrates, such as: SiO2/Si, Silicon Wafers, PET, PI, ITO, FTO, and Glass. Stanford Advanced Materials (SAM) has extensive experience in the manufacture and supply of high-quality Tungsten Diselenide-CVD Films.

Related products: Nickel Telluride CVD Film (NiTe2), Bismuth Selenide CVD Film (Bi2Se3), Tin Diselenide Sapphire Film (SnSe2)

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