TA1322 Spherical Tantalum Powder (Ta)

Spherical Tantalum Powder (Ta) Description

Spherical Tantalum Powder (Ta) is utilised in both traditional and technological industries. It is applied in cold gas spraying, plasma spraying of feedstock materials, as an ultra‐pure target alloy additive, in the SLM manufacture of surgical metal implants and orthopaedic prostheses, and in the additive production of acid‐ and corrosion‐resistant complex shielding components. It is defined by high purity, uniform particle size, complete surface structure, ease of dispersion, a large specific surface area and high surface activity. Tantalum capacitors are the most frequently used capacitor products in military electronics. As electronic products become smaller, tantalum capacitors must develop in the direction of miniaturisation and increased capacitance.

Spherical Tantalum Powder (Ta) Specifications

1. Ta (50nm)

2. Ta (100nm)

3. Ta (1-10µm)

4. Ta (5-25µm)

5. Ta (15-45µm)

Spherical Tantalum Powder (Ta) Applications

Spherical Tantalum Powder (Ta) is deployed in varied applications across traditional and technological industries. It is employed in cold gas and plasma spraying to provide feedstock materials. It serves as an ultra‐pure target alloy additive that improves quantifiable alloy properties. In manufacturing, the powder is utilised in selective laser melting (SLM) to produce surgical metal implants, including orthopaedic prostheses. It is also applied in additive manufacturing for the fabrication of acid‐ and corrosion‐resistant complex shielding components.

Each application is supported by precise process data, thereby ensuring measurable performance improvements.

Spherical Tantalum Powder (Ta) Packaging

Our spherical tantalum powder (Ta) is carefully maintained during storage and transport to preserve the product in its original condition.

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