Cerium(III)-fluoride Vapour Deposition Materials Description
This page provides detailed technical information regarding Cerium(III)-fluoride vapour deposition materials and their applications in various industries. It outlines the key characteristics and utilisation parameters of CeF3 in thin film deposition processes.
Cerium(III)-fluoride Vapour Deposition Materials Specification
Specification |
Details |
Material Type |
Cerium(III)-fluoride |
Symbol |
CeF3 |
Appearance/Colour |
White crystalline solid |
Melting Point |
1 460 °C (2 660 °F; 1 730 K) |
Density |
6.16 g/cm3 (at 20 °C) |
Purity |
99.9% ~ 99.99% |
Form |
Powder/Granulate/Custom |
Main Features of Cerium(III)-fluoride Vapour Deposition Materials
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Chemical Composition: Cerium(III)-fluoride (CeF3) comprises cerium (Ce) and fluorine (F) and is delivered as a white crystalline solid.
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High Melting Point: CeF3 has a melting point of 1 460 °C (2 660 °F; 1 730 K), which meets the requirements for high-temperature processes.
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Density: With a density of 6.16 g/cm3 at 20 °C, the material demonstrates stability for thin film deposition.
Applications for Cerium(III)-fluoride Vapour Deposition Materials
1. Optical Coatings: Cerium(III)-fluoride thin films are used for coating lenses, mirrors and various optical components. The refractive properties assist in controlling light transmission and reflection.
2. Catalysts: CeF3 is employed as a catalyst in chemical processes, including processes within the automotive sector.
3. Scintillators: The luminescent properties of CeF3 support its use in scintillators for detecting ionising radiation in medical imaging and security systems.
The properties of Cerium(III)-fluoride vapour deposition materials are applied in various industrial sectors.
Cerium(III)-fluoride Vapour Deposition Materials Packaging
The Cerium(III)-fluoride (CeF3) vapour deposition materials are vacuum-sealed. Safety Data Sheets and material certification documents accompany the product.