AL10253 Sapphire Wafer Al2O3 R plane 5x5x0.5 mm

Sapphire Wafer Al2O3 R plane 5x5x0.5 mm Description

Sapphire Wafer Al2O3 R plane 5x5x0.5 mm is an Al2O3 substrate engineered for high-precision fabrication in semiconductor and optical research. Its dimensions of 5 mm x 5 mm and 0.5 mm thickness ensure compatibility with standard processing equipment. The R-plane orientation promotes improved surface uniformity and layer adhesion, enabling effective deposition and etching operations. The inherent chemical inertness of Al2O3 further supports its use in environments requiring minimal contamination.

Sapphire Wafer Al2O3 R plane 5x5x0.5 mm Applications

Electronics and Semiconductor Applications
- Used as a substrate in integrated circuits to enhance electrical isolation by leveraging its chemical inertness.
- Applied as a base in MEMS devices to achieve stable performance through its controlled dimensions and uniform surface characteristics.

Optical and Precision Instrumentation
- Serves as a component in LED and laser systems to support thermal stability by utilising its high thermal conductivity.
- Employed in optical sensors to facilitate accurate layer deposition owing to its consistent R-plane orientation.

Sapphire Wafer Al2O3 R plane 5x5x0.5 mm Packing

The wafer is packaged individually in anti-static containers with foam inserts to cushion mechanical stress. Sealed pouches with desiccant packets help prevent moisture exposure, and the substrate is stored flat to maintain its integrity. Additional options, such as custom labelling and container modifications, are available to align with specific laboratory and industrial handling requirements.

Frequently Asked Questions

Q1: How does the R plane orientation benefit subsequent processing steps?
A1: The R plane orientation minimises surface irregularities and enhances layer adhesion during deposition and etching processes. This consistency is crucial for applications requiring precise patterning and accurate device fabrication.

Q2: What handling measures are recommended to maintain wafer integrity?
A2: It is advised to handle the wafer in a cleanroom using anti-static tools and to store it in sealed, cushioned packaging. These measures help protect against particulate contamination and mechanical stress during processing and transit.

Q3: Are custom dimensions available for this wafer substrate?
A3: Customisation of wafer dimensions is feasible following a technical review. Specific requirements are assessed to ensure that crystallographic quality and processing compatibility are maintained, with modifications evaluated on a case-by-case basis.

Additional Information

Sapphire, or aluminium oxide (Al2O3), is valued in materials science for its chemical inertness and high thermal conductivity. These characteristics make it a suitable candidate for substrates in applications that demand stable thermal and chemical performance, particularly in semiconductor processing and optical component manufacturing.

Advancements in substrate preparation techniques have enhanced the reproducibility of crystal orientation and thickness control. Understanding the interplay between crystallography and material properties is essential for optimising performance in precision manufacturing environments and facilitating new developments in device integration.