AL10264 Sapphire Wafer Al2O3 M plane 10x10x1.0 mm

Sapphire Wafer Al2O3 M plane 10x10x1.0 mm Description

Sapphire Wafer Al2O3 M plane 10x10x1.0 mm is fabricated from high-purity aluminium oxide (Al2O3) with an M plane orientation, optimised for applications requiring precise crystallographic properties. The wafer’s dimensions ensure compatibility with standard processing equipment, whilst controlled thickness and flatness help enhance performance in optical and semiconductor environments. Its intrinsic hardness and chemical inertness also serve as a stable base for subsequent epitaxial growth, minimising defect propagation.

Sapphire Wafer Al2O3 M plane 10x10x1.0 mm Applications

Electronics
- Used as a substrate in LED devices to achieve uniform light emission by leveraging the wafer's consistent crystallographic orientation.

Semiconductor Processing
- Employed as a carrier wafer during device fabrication to optimise thermal management by utilising its high thermal conductivity and dimensional stability.

Optical Components
- Applied as a base in optical sensor assemblies to enhance signal integrity through its chemically inert and smooth surface properties.

Sapphire Wafer Al2O3 M plane 10x10x1.0 mm Packing

The wafer is individually secured in a static-dissipative container with foam cushioning to absorb mechanical shocks. It is sealed in an anti-static bag to prevent particulate contamination and electrostatic discharge. The packaging is designed for storage in a temperature- and humidity-controlled environment. Custom labelling and compartmentalised packaging options are available to meet specific handling and shipping requirements.

Frequently Asked Questions

Q1: How does the M plane orientation influence device performance?
A1: The M plane orientation provides a unique crystallographic surface that enhances epitaxial layer growth uniformity. This results in improved film adhesion and reduced defect density, benefiting semiconductor and optical applications by facilitating more precise device fabrication.

Q2: What are the recommended storage conditions for the wafer?
A2: The wafer should be stored in a clean, temperature-controlled, and low-humidity environment to prevent moisture absorption and thermal stress. Proper anti-static and cushioned packaging is essential to mitigate mechanical damage and contamination risks.

Q3: Can SAM provide customisation in wafer dimensions or surface finishes?
A3: Yes, SAM offers limited customisation options such as adjustments in thickness, lateral dimensions, and surface finish. Technical reviews ensure that any modifications adhere to process compatibility requirements necessary for advanced fabrication environments.

Additional Information

Sapphire, a crystalline form of aluminium oxide (Al2O3), is renowned for its high thermal conductivity, chemical inertness, and mechanical hardness. These characteristics make it well-suited for applications that demand stable performance under harsh operating conditions. Its optical transparency and electrical insulation properties also facilitate its use in various high-precision electronic equipment.

In the context of crystal substrates, the intrinsic properties of sapphire contribute to improved device reliability and performance during advanced semiconductor and optical fabrications. Understanding the material science behind Al2O3 substrates aids in optimising process parameters for next-level integration in high-demand industrial and research applications.