AL10268 Sapphire Wafer Al2O3 (10-14) 10x10x0.5 mm

Sapphire Wafer Al2O3 (10-14) 10x10x0.5 mm Description

Sapphire Wafer Al2O3 (10-14) 10x10x0.5 mm is a monocrystalline substrate composed of high-purity aluminium oxide (Al2O3). Its defined (10-14) orientation and precise dimensions ensure compatibility with standard processing equipment. The wafer offers chemical inertness and thermal stability, which are critical for semiconductor fabrication and optical applications. Its minimal defect density and controlled surface finish facilitate effective integration into research and industrial systems.

Sapphire Wafer Al2O3 (10-14) 10x10x0.5 mm Applications

Electronics and Semiconductor Applications
- Used as a substrate in high-power LED assemblies to achieve improved heat dissipation by leveraging its controlled thickness and uniform crystallographic structure.

Optical Instrumentation
- Applied as an optical window in laser assemblies to attain minimal light scattering by utilising its high purity and consistent crystal orientation.

Industrial Sensors
- Serves as a dielectric substrate in sensor modules to maintain operational stability by taking advantage of its chemical inertness and precise dimensions.

Sapphire Wafer Al2O3 (10-14) 10x10x0.5 mm Packing

Each wafer is individually secured in an anti-static tray within a moisture-controlled, cleanroom-certified packaging box. Protective foam inserts and a plastic seal minimise mechanical impacts and particulate contamination. Storage guidelines recommend a dry, temperature-controlled environment. Custom packaging options, including specialised compartments and labeling, are available to meet distinct handling and shipment requirements.

Frequently Asked Questions

Q1: What measures are implemented to control wafer uniformity in Sapphire Wafer Al2O3 (10-14) 10x10x0.5 mm?
A1: SAM utilises high-resolution SEM and AFM analysis to monitor surface uniformity and crystallographic orientation, ensuring each wafer adheres to precise dimensional and surface finish criteria.

Q2: How does the 10x10 mm size benefit semiconductor processing?
A2: The 10x10 mm dimension matches standard wafer processing equipment, facilitating integration into existing manufacturing lines, which streamlines production cycles.

Q3: What storage conditions are recommended to maintain the wafer’s properties?
A3: The wafer should be stored in a controlled, dry environment with a stable temperature to prevent contamination and preserve its intrinsic material properties.

Additional Information

Sapphire wafers, constituted of high-purity Al2O3, offer advantageous properties such as chemical inertness and thermal conductivity. Their single-crystal nature is critical for applications requiring precise lattice structure and minimal defect density. These characteristics make them suitable substrates in fields where stability under high temperatures and corrosive conditions is mandatory.

Within the broader context of electronic and optical device fabrication, understanding the properties of Al2O3 is essential. Advances in controlled deposition techniques and surface metrology have improved material uniformity, thereby enhancing overall device performance and facilitating research into semiconductor and opto-electronic applications.