AL10280 Sapphire Wafer Al2O3 (0001) 100 mm Dia. x 0.9 mm

Sapphire Wafer Al2O3 (0001) 100 mm Dia. x 0.9 mm Description

The Sapphire Wafer Al2O3 (0001) 100 mm Dia. x 0.9 mm is a high-purity alumina substrate with a precise (0001) plane orientation. Its 100 mm diameter and 0.9 mm thickness meet standard semiconductor process equipment requirements. The wafer undergoes advanced surface analysis to ensure low roughness and minimal defects, thereby enhancing its performance in applications requiring stringent flatness and dimensional accuracy.

Sapphire Wafer Al2O3 (0001) 100 mm Dia. x 0.9 mm Applications

Electronics and Semiconductor Applications
- Used as a substrate in semiconductor device fabrication to achieve precise photolithography by leveraging its minimal surface imperfections for enhanced pattern resolution.
- Applied as a base in high-frequency circuits to manage dielectric consistency by utilising its stable electrical insulation properties.

Industrial Applications
- Serves as an insulating component in power electronics to maintain thermal stability by utilising its high thermal conductivity and minimal defect density. 

Optoelectronics
- Used as a support layer in LED manufacturing to ensure uniform light emission by taking advantage of its optical transparency and structural integrity.

Sapphire Wafer Al2O3 (0001) 100 mm Dia. x 0.9 mm Packing

Each wafer is individually enclosed in a cleanroom-grade, anti-static pouch and secured within cushioned, foam-lined carriers. The packaging maintains an inert environment to prevent surface contamination and mechanical damage. Storage guidelines recommend a controlled temperature and humidity environment. Custom labelling and container modifications are available to meet specific storage and shipment protocols.

Frequently Asked Questions

Q1: How does the substrate surface finish impact process performance?
A1: The surface finish directly affects photolithography outcomes and subsequent film deposition. A uniformly smooth surface minimises scattering and irregularities, thus enhancing process consistency in device fabrication.

Q2: What environmental conditions should be maintained during storage?
A2: The wafer should be stored in a temperature-controlled, low-humidity environment. These conditions help maintain the surface integrity and prevent contamination, which is crucial for high-precision applications.

Q3: How are quality control measures implemented for this wafer?
A3: Quality control involves quantitative surface roughness measurement using atomic force microscopy and defect inspection via scanning electron microscopy. These evaluations ensure adherence to strict manufacturing standards and process specifications.

Additional Information

Sapphire, or single-crystal aluminium oxide (Al2O3), is widely recognised for its hardness and high thermal stability. The material’s crystalline structure provides an optimal platform for high-performance electronic and optoelectronic devices. Its use in substrates requires stringent quality control to maintain flatness and surface uniformity during high-temperature processing.

In the broader context of material science, sapphire wafers represent a critical component in advanced semiconductor and photonic device manufacturing. Their ability to withstand aggressive processing environments while offering stable electrical and optical properties underscores their importance in both research and high-volume production settings.