AL10286 Sapphire Wafer Al2O3 M Plane Dia. 1 inch x 0.5 mm

Sapphire Wafer Al2O3 M Plane Dia. 1 inch x 0.5 mm Description

This substrate, composed of high-purity Al2O3, features a precise M Plane orientation. Its 1-inch diameter and 0.5 mm thickness provide excellent compatibility with standard semiconductor fabrication tools. The chemically inert nature of sapphire offers resistance against oxidation and thermal stresses, making it suitable for applications in electronic wafer processing and research equipment prototyping.

Sapphire Wafer Al2O3 M Plane Dia. 1 inch x 0.5 mm Applications

1.       Electronics
   - Used as a substrate in high-frequency circuit assemblies to achieve effective insulation by leveraging the chemical inertness of alumina.
   - Applied as a base material for sensor arrays to support stable electrical performance owing to its uniform surface and controlled dimensional tolerances.

2.       Industrial
   - Utilised as a carrier wafer in semiconductor processing to facilitate uniform thin-film deposition by capitalising on its precise geometry and surface consistency.

3.       Research
   - Serves as a test platform in materials science studies to analyse crystalline behaviour under varying thermal conditions by providing a well-characterised Al2O3 template.

Sapphire Wafer Al2O3 M Plane Dia. 1 inch x 0.5 mm Packing

The wafer is individually sealed in an anti-static package and cushioned with foam to minimise mechanical stress during transit. It is stored in a temperature-controlled container to reduce exposure to moisture and particulates. The packaging includes barriers against contamination and options for customisation, such as labelling and compartmentalisation based on specific handling needs.

Frequently Asked Questions

Q1: What quality control methods are applied to monitor the wafer’s dimensional accuracy?
A1: The production process includes optical interference and profilometry tests that verify the diameter and thickness within strict tolerances, ensuring the wafer meets precise specifications for semiconductor and research applications.

Q2: How does the M Plane orientation influence its integration in devices?
A2: The M Plane orientation affects anisotropic thermal and electrical properties, which are critical for devices that depend on substrate uniformity. This influences parameters such as thermal conductivity and dielectric constant, key for high-performance electronic assemblies.

Q3: What storage conditions are recommended to preserve the wafer’s integrity?
A3: The wafer should be stored in a clean, temperature-controlled environment with low humidity. Anti-static and cushioning packaging further prevents mechanical damage and contamination, maintaining the substrate's surface quality.

Additional Information

Sapphire, or alpha-alumina (Al2O3), is valued for its high hardness, thermal stability, and chemical inertness. These characteristics make it a preferred material in applications requiring durable and stable substrates. Its crystalline structure also provides advantageous thermal and optical properties, which are critical in precision device manufacturing.

Understanding the role of crystallographic orientation in sapphire substrates is essential. The M Plane orientation modifies anisotropic properties, influencing thermal expansion and dielectric behaviour. This knowledge is important when integrating these wafers into semiconductor processes where adherence to dimensional and surface quality standards is crucial.