AL10289 Sapphire Wafer Al2O3 R Plane 100 mm Dia x 0.46 mm

Sapphire Wafer Al2O3 R Plane 100 mm Dia x 0.46 mm Description

Sapphire Wafer Al2O3 R Plane 100 mm Dia x 0.46 mm is crafted from high-purity Al2O3 with a specific R plane cut, providing controlled crystalline orientation. The dimensions of 100 mm diameter and 0.46 mm thickness ensure compatibility with standard semiconductor and optical fabrication equipment. The material's chemical inertness and mechanical hardness make it suitable for applications where durability and minimal surface contamination are critical.

Sapphire Wafer Al2O3 R Plane 100 mm Dia x 0.46 mm Applications

1.      
Electronics
   - Used as an insulating substrate in microelectronic circuits to achieve efficient thermal management by leveraging sapphire's high thermal conductivity.
   - Applied as a dielectric layer in high-frequency components to minimise signal interference through its stable electrical characteristics.

2.      
Optical Systems
   - Serves as an optical window in high-temperature or chemically aggressive environments to maintain clarity and durability by utilising sapphire’s excellent transmission properties.
   - Frequently used in laser optics as a protective cover for sensitive components, offering resistance to scratches and chemical etching.

Sapphire Wafer Al2O3 R Plane 100 mm Dia x 0.46 mm Packing

The wafer is individually packaged in an anti-static, foam-lined carrier to minimise mechanical shocks and surface contamination. It is stored in a dust-free, temperature-controlled container under cleanroom conditions. Detailed labelling and custom compartmentalisation options are available to meet specific processing and handling requirements. This packaging is designed to protect the wafer during shipping and long-term storage.

Frequently Asked Questions

Q1: What surface quality measurements are typically conducted on this wafer?
A1: Surface quality is evaluated using interferometry and atomic force microscopy to assess planarity and roughness. These measurements help in determining the wafer’s suitability for applications requiring minimal scattering and defect-free surfaces.

Q2: How does the R plane orientation affect processing in semiconductor applications?
A2: The R plane orientation offers unique etching properties and influences dislocation dynamics during device fabrication. This controlled orientation can lead to better film deposition uniformity and improved process reproducibility in semiconductor manufacturing.

Q3: What storage conditions are recommended for maintaining the wafer’s integrity?
A3: The wafer should be stored in a clean, temperature-controlled environment with humidity regulation to limit contamination and material degradation. Anti-static measures are also advised to prevent particulate accumulation on the surface.

Additional Information

Sapphire, or single-crystal aluminium oxide, is widely used in both electronic and optical industries for its distinct properties such as high mechanical strength, thermal conductivity, and chemical inertness. Its single-crystal nature allows for consistent performance in applications requiring precise control over material characteristics, including substrate development and protective components.

Research in materials science continues to enhance the understanding of sapphire’s surface interactions and defect management, which are critical for advanced device fabrication and high-performance optical systems.