CE10451 Cerium Oxide Powder, CeO2 Powder 99%

Cerium Oxide Powder, CeO2 Powder 99% Description

Cerium Oxide Powder (CeO2) is a chemically inert powder widely used in catalytic, polishing, and ceramic applications. Its 99% purity is maintained through strict processing protocols that control particle size distribution. The powder’s consistent chemical composition and structure facilitate reliable performance in abrasive treatments and interface modifications, supporting processes that require precise material interactions.

Cerium Oxide Powder, CeO2 Powder 99% Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Cerium Oxide Powder, CeO2 Powder 99% Applications

Electronics and Industrial Applications
- Used as a polishing agent in semiconductor wafer processing to achieve smoother surfaces by utilising its microabrasive properties.
- Applied as a catalyst in oxidation reactions within industrial systems to facilitate efficient conversion by utilising its redox characteristics.

Ceramic and Surface Treatment Applications
- Serves as a sintering aid in ceramic formulations to improve densification and microstructural uniformity through its reactivity at high temperatures.
- Frequently used in glass and enamel manufacturing to enhance optical clarity by controlling particle dispersion.

Cerium Oxide Powder, CeO2 Powder 99% Packing

The powder is packed in moisture-resistant, multi-layer pouches, which are then secured inside sealed rigid containers. This packaging design incorporates anti-static measures and moisture barriers to prevent contamination during transit and storage. The product should be stored in a controlled, dry environment with stable temperature conditions. Customised packaging options, including bulk sizes and specific labelling, are available upon request.

Frequently Asked Questions

Q1: What processing methods are used to maintain the powder’s 99% purity?
A1: The powder undergoes controlled calcination and milling, accompanied by rigorous particle size analysis using in-house XRD and TEM methods. These steps ensure that the chemical composition remains at 99% and minimise contaminants that could affect performance in demanding applications.

Q2: How does the particle size distribution impact the performance in polishing applications?
A2: A narrow and controlled particle size distribution enhances the consistency of abrasive action, ensuring uniform surface treatment. This control minimises surface defects and increases process predictability in applications such as semiconductor wafer polishing and precision surface finishing.

Q3: What storage conditions are recommended to preserve the powder’s properties?
A3: It is recommended to store the powder in a dry environment with stable, moderate temperatures. The multi-layer, moisture-resistant packaging and anti-static features help protect the powder from humidity and contamination, thereby preserving its physical and chemical properties.

Additional Information

Cerium oxide is widely studied in materials science due to its unique redox behaviour and oxygen storage capacity. Its chemical stability and reactivity are key factors in applications ranging from catalysis to abrasive formulations. Research in this field often focuses on optimising particle morphology and purity to enhance overall performance in industrial settings.

Advancements in analytical methods such as X-ray diffraction and electron microscopy have provided deeper insights into the microstructural characteristics of cerium oxide powders. These techniques support the development of manufacturing processes that ensure consistent product quality, meeting the exacting demands of industrial and research applications.