CY8503 LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm

LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm Description

Our LAO (LaAlO₃) Lanthanum Aluminate Crystal Substrate (110) 5×5×0.5 mm provides exceptional stability, making it a preferred choice for advanced thin-film research and development. With a lattice constant closely matching many functional materials, it facilitates epitaxial growth of high-temperature superconductors, ferroelectric layers, and magnetic films. Its dielectric properties and low leakage current support reliable data in electronic and optoelectronic applications. Additionally, the substrate’s thermal conductivity and chemical inertness enhance its performance under rigorous processing conditions.

Produced under strict quality controls, each substrate is precisely oriented to the (110) plane, ensuring uniform epitaxial properties across the surface. The crystal undergoes meticulous polishing to achieve minimal roughness and minimal defect density. This attention to detail ensures consistent results in high-end research environments and industrial fabrication lines.

LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm Applications

Lanthanum Aluminate (LaAlO₃) crystalline substrates stand out for their structural and thermal stability, enabling advanced uses across various fields. Their unique properties, such as high dielectric constant, low loss tangent, and remarkable lattice matching, make them ideal for thin-film deposition and quality epitaxy. These characteristics reinforce the importance of LAO substrates in industrial, research, and commercial applications, particularly when offered in the (110) 5x5x0.5 mm format.

1. Industrial Applications

·         Surface Acoustic Wave (SAW) Devices: The mechanical stability of LAO supports efficient wave propagation for sensors.

·         High-Temperature Electronics: Its thermal properties enable durable operation in harsh industrial conditions.

2. Research Applications

·         Epitaxial Thin-Film Studies: Researchers rely on LAO’s lattice matching to produce high-quality thin films.

·         Superconducting Layer Investigations: The substrate’s low loss tangent is crucial for exploring superconducting materials and phenomena.

3. Commercial Applications

·         Optical Coatings: LAO’s low defect rate allows uniform coating layers for precise optical components.

·         Electronic Packaging: Its dielectric properties are valuable for packaging sensitive electronic systems.

LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm Packaging

Each LAO (LaAlO₃) Lanthanum Aluminate Crystal Substrate (110) 5×5×0.5 mm is packaged in an antistatic pouch, surrounded by foam inserts within a sturdy, sealed container. This setup protects against mechanical damage and prevents contamination from airborne particles. Store in a clean, dry environment at stable room temperature, avoiding direct sunlight or moisture. Customised labelling and alternative packaging configurations are available upon request to accommodate specific handling and transport requirements.

Packaging: Vacuum sealed, Wooden Box, or Customised.

LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm FAQs

Q1: What are the key material properties of LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm?

A1: LaAlO3 (110) crystal substrates exhibit a high dielectric constant (approximately 24), low leakage current, and an excellent lattice match to a range of oxide thin films. They feature a rhombohedral crystal structure with minimal twinning and a moderate thermal expansion coefficient of approximately 10×10^-6 K^-1. These properties make them ideal for advanced electronics, superconducting devices, and epitaxial growth applications requiring consistent, high-quality crystal performance.

Q2: How should this product be handled and stored?

A2: Due to its brittle nature, each LAO (110) substrate must be handled with gloves or tweezers to prevent scratches and contamination. It is recommended to store the product in a clean, humidity-controlled environment, preferably in anti-static packaging. Avoid exposing it to sudden temperature changes or direct sunlight, as these factors can induce unwanted stress and degrade the substrate’s integrity over time.

Q3: Which quality standards and certifications apply to LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm?

A3: LaAlO3 (110) substrates typically adhere to industry standards, including ISO 9001 for quality management systems and ISO 14001 for environmental stewardship. Many suppliers also comply with RoHS (Restriction of Hazardous Substances) guidelines to limit hazardous elements. Manufacturers utilise advanced metrology tools, such as X-ray diffraction and atomic force microscopy, to confirm crystal orientation accuracy, surface finish quality, and overall substrate performance.

Related Information

1. Material Properties and Advantages

This LAO (LaAlO3) Lanthanum Aluminate Crystal Substrate (110) 5x5x0.5 mm displays structural integrity and chemical stability that are crucial for advanced electronic and optical applications. It offers a reliable lattice match for numerous thin films, including high-temperature superconductors, ensuring minimal dislocation densities and optimised device performance.

Its thermal expansion properties closely align with those of many epitaxial films, thereby reducing strain and enhancing longevity in complex multilayer devices. Furthermore, the substrate’s wide bandgap ensures resistance to high electric fields, making it an excellent choice for power electronics and high-frequency components.

2. Applications in Advanced Industries

Because of its dielectric properties and precision-oriented crystalline surface, this LAO substrate finds use in microelectronics, high-speed telecommunications, and quantum computing. It provides a stable foundation for the fabrication of superconducting circuits, contributing to lower energy consumption and improved overall system efficiency.

Unique to this substrate is its ability to facilitate the creation of thin film layers used in research-grade sensors, photonic devices, and integrated circuits. By delivering consistent performance across a broad temperature range, it enables engineers and researchers to progress in material science and device innovation.