CY8537 Silicon (Si) Crystal Substrate (110) 5x5 mm

Silicon (Si) Crystal Substrate (110) 5x5 mm Description

Designed for advanced microfabrication and photonics research, our 5 × 5 mm Silicon (110) Crystal Substrate offers precision and uniformity. This substrate’s (110) Miller index orientation provides anisotropic properties, making it valuable for nano-scale device engineering. Each substrate is manufactured to stringent quality standards, ensuring minimal surface defects, low roughness, and exceptional purity. This results in epitaxial growth performance and reliable operation in high-temperature and high-stress environments. Applications include microelectromechanical systems (MEMS), thin-film deposition, and sensor development.

Our production process and quality control ensure flatness and dimensional accuracy. This substrate is the solution for researchers and engineers seeking a stable and reliable platform for their demanding semiconductor projects.

Silicon (Si) Crystal Substrate (110) 5x5 mm Applications

Silicon (110) crystal substrates, measuring 5x5 mm, are prized for their structural properties and consistent crystal orientation that enable device performance. These substrates enable precise patterning and support various industrial, research, and commercial efforts. With high purity and electrical characteristics, they serve as platforms for a range of applications involving microelectronics and nanofabrication.

1. Industrial Applications

·         Application 1: Conductive wafer-level packaging of microelectronics, capitalising on the (110) orientation for reliable bonding and minimal signal distortion.

·         Application 2: High-precision sensors for automotive and aerospace applications, leveraging the stress-response characteristics of the (110) plane for reliability.

·         Application 3: Microfabrication of MEMS devices requiring uniform thickness, ensuring consistent mechanical properties under operating conditions.

2. Research Applications

·         Application 1: Epitaxial growth studies for semiconductor R&D, using the (110) substrate to examine lattice strain and defect propagation.

·         Application 2: Quantum device prototypes where surface orientation is critical for electron mobility and reduced scattering.

·         Application 3: Fundamental physics experiments investigating thermal and electrical transport properties in defined crystal orientations.

3. Commercial Applications

·         Application 1: Integrated photonics components that exploit the (110) plane’s refractive indices for light propagation.

·         Application 2: Thin-film coatings and protective layers, benefiting from substrate quality and adhesion.

·         Application 3: Consumer electronics sensors (e.g., pressure or touch sensors) that utilise the substrate’s stability under varying environmental conditions.

Silicon (Si) Crystal Substrate (110) 5x5 mm Packaging

Each 5×5 mm Si (110) substrate is packaged in a clean, static-free environment using cushioned, low-particulate materials to ensure safety and product integrity. Surfaces are protected from moisture and dust with sealed, anti-contamination protective films. The sealed container is stored under controlled temperature and humidity to minimise oxidation. Customisation options, such as double-layer vacuum-sealed packaging or specialised carriers, are also available to meet handling and shipping needs.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Silicon (Si) Crystal Substrate (110) 5x5 mm FAQs

Q1: What are the key material properties of Silicon (Si) Crystal Substrate (110) 5x5 mm?

A1: Silicon (Si) Crystal Substrate with (110) orientation offers anisotropic properties compared to the more common (100) orientation. It has a cubic diamond crystal structure, high purity levels (often 99.9999%), and a thermal conductivity around 150 W/m·K at room temperature. The (110) plane exhibits different fracture strength and electronic band structure, making it suitable for device fabrication, including advanced transistor channels and microelectromechanical systems (MEMS).

Q2: How should this product be handled and stored?

A2: Handle these substrates by their edges or with cleanroom gloves to avoid contamination and damage. Store them in a dust-free, temperature-controlled environment to preserve surface integrity and prevent oxidation. Use protective carriers or wafer boxes to guard against mechanical stress. Regular inspection with a microscope or surface profilometer is recommended to confirm cleanliness and surface quality before processing. Avoid excessive force or bending to maintain crystal integrity.

Q3: Which quality standards and certifications apply to Silicon (Si) Crystal Substrate (110) 5x5 mm?

A3: Silicon (110) substrates typically conform to SEMI M1 specifications for wafer geometry, flatness, and surface quality. Manufacturers often adhere to ISO 9001 for quality management systems, ensuring consistent production and inspection protocols. Epitaxial and doping tolerances are verified through methods like four-point probe measurement or secondary ion mass spectrometry (SIMS). These certifications guarantee traceability, reproducibility, and compliance with international standards, making the substrates suitable for precision research and industrial applications.

Related Information

1. Manufacturing Process

The creation of a Silicon (Si) Crystal Substrate (110) 5x5 mm typically begins with the growth of a high-purity silicon ingot, which is then oriented and sliced to achieve the (110) crystallographic plane. During these steps, advanced sawing and polishing procedures are employed to maintain the substrate’s flatness, minimise defects, and preserve its uniform thickness, ensuring that the (110) orientation is accurately presented across the entire 5x5 mm surface.

Precision techniques are crucial in further refining the substrate. After slicing, surfaces undergo an extensive cleaning regimen to remove contaminants, followed by etching processes that enhance the smoothness of the crystal lattice. This approach helps maintain consistent electrical and mechanical characteristics, enabling the Silicon (Si) Crystal Substrate (110) 5x5 mm to meet the requirements of microelectronics and nanotechnology applications.

2. Applications in Advanced Industries

Usage of the Silicon (Si) Crystal Substrate (110) 5x5 mm can be found in electronic devices, where the crystallographic orientation provides electrical properties suited for transistor configurations. Its structural alignment also supports sensor technologies, in the fabrication of MEMS devices and photodetectors.

Performance in challenging conditions makes this substrate ideal for precision realms, such as optoelectronics and quantum computing. By leveraging the carrier mobility characteristic of the (110) crystallographic plane, engineers are able to develop components with improved speed and sensitivity, facilitating innovation in cutting-edge industries.