CY8540 Silicon (Si) Crystal Substrate (110) 10x10 mm

Silicon (Si) Crystal Substrate (110) 10x10 mm Description

Our Silicon (Si) Crystal Substrate (110) 10×10 mm is precisely fabricated from high-purity single-crystal silicon, ensuring exceptional uniformity and low defect density. The (110) crystallographic orientation offers advantages for device fabrication processes, including anisotropic etching and epitaxial growth. Its consistent lattice structure helps minimise strain in epitaxial layers, improving device performance and overall reliability. Furthermore, the smooth surface finish and tight dimensional tolerances enable integration into various research and industrial applications.

Designed to meet rigorous quality standards, this substrate undergoes strict inspection and cleaning procedures to reduce contamination and maintain optimal wafer surfaces. Whether you are investigating novel semiconductor materials, developing integrated circuits, or exploring MEMS devices, our Silicon (Si) Crystal Substrate (110) 10×10 mm delivers the precision, durability, and consistency required for results.

Silicon (Si) Crystal Substrate (110) 10x10 mm Applications

Silicon (Si) Crystal Substrate (110) 10x10 mm is renowned for its uniform crystalline structure, consistent doping, and thermal stability. This compact substrate is highly sought after in electronics, precision optics, and materials testing. With properties such as high purity, excellent carrier mobility, and dimensional accuracy, it plays a pivotal role across various domains driving innovation and research breakthroughs. Engineered for reliability, it supports device performance.

1. Industrial Applications

·         Application 1: Utilised in high-temperature machinery components due to thermal resistance and stability

·         Application 2: Employed in large-scale semiconductor fabrication processes for precise wafer production

2. Research Applications

·         Application 1: Integral to experimental quantum computing devices where controlled doping is crucial

·         Application 2: Essential for developing nanoelectronic devices, enabling exploration of transistor architectures

3. Commercial Applications

·         Application 1: Found in high-end consumer electronics to ensure device longevity and efficiency

·         Application 2: Used in photovoltaic technologies for enhanced solar cell performance and energy conversion

Silicon (Si) Crystal Substrate (110) 10x10 mm Packaging

Each 10×10 mm Silicon (Si) Crystal Substrate (110) is protected in an anti-static sealed pouch with foam inserts to prevent mechanical damage. The packaging includes humidity-control desiccants to maintain dryness and reduce contamination risk. Store them in clean, temperature-controlled environments, away from direct sunlight. Double-sealing and vacuum options are available for enhanced cleanliness. Custom labelling, specialised packaging, and quantity adjustments can be accommodated upon request.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Silicon (Si) Crystal Substrate (110) 10x10 mm FAQs

Q1: What are the key material properties of Silicon (Si) Crystal Substrate (110) 10x10 mm?

A1: The Silicon (Si) Crystal Substrate (110) is known for its well-defined crystallographic orientation, high purity, and precise doping control. With a lattice constant of approximately 5.431 Å, it offers mechanical stability, hardness around 1150 HV, and thermal conductivity of 148 W/m·K. This orientation (110) is particularly beneficial for specific device applications due to its anisotropic electrical and optical properties.

Q2: How should this product be handled and stored?

A2: These substrates are typically handled with cleanroom gloves and stored in inert or vacuum-sealed packaging to avoid contamination or oxidation. Surfaces can be sensitive to scratches, so it is essential to use only non-abrasive materials during cleaning. Temperature fluctuations should be minimised to prevent warping, and humidity must be controlled to avoid moisture absorption that can affect the substrate’s surface integrity.

Q3: Which quality standards and certifications apply to Silicon (Si) Crystal Substrate (110) 10x10 mm?

A3: For strict performance criteria, these substrates commonly comply with ISO 9001 quality management systems. Many suppliers also follow SEMI standards such as M1 for silicon wafer specifications, ensuring consistent thickness, flatness, and crystallographic orientation. Routine checks using X-ray diffraction and surface profilometry verify substrate uniformity. Additionally, compliance with RoHS directives ensures environmentally responsible manufacturing free from hazardous substances such as lead, mercury, or cadmium.

Related Information

1. Material Properties and Advantages

Silicon (Si) Crystal Substrate (110) 10x10 mm is renowned for its versatile structure, making it ideal for numerous high-precision applications. Its (110) orientation provides a set of crystallographic characteristics, enabling carrier mobility in transistor designs and enhancing surface conduction properties. This specific orientation also offers uniformity in thin film deposition, ensuring that researchers and manufacturers can achieve reliable results when developing electronic and photonic devices.

Thanks to its compact 10x10 mm size, this substrate is particularly convenient for laboratory testing and small-scale production runs. It strikes a balance between material efficiency and device performance, allowing for cost-effective prototyping without sacrificing accuracy or consistency. Its ability to maintain stable electrical characteristics under various environmental conditions further cements its role in semiconductor research and microfabrication processes.

2. Global Market Trends

Heightened demand for energy-efficient technologies and miniaturised components is driving significant interest in Silicon (Si) Crystal Substrate (110) 10x10 mm. Industries such as microelectronics, photovoltaics, and sensor manufacturing are actively adopting these substrates to address the growing call for high-performance, low-power devices. As semiconductor fabrication facilities expand worldwide, manufacturers of this substrate benefit from establishing reliable supply chains and catering to international markets that prioritise precise crystallographic orientation and consistent material properties.

In recent years, collaborative initiatives among research institutes, technology firms, and government bodies have boosted overall investment in silicon substrate innovation. The surge in global partnerships has accelerated the exploration of novel device architectures and processing techniques, ultimately reinforcing the commercial viability of small-format substrates like the 10x10 mm (110)-oriented Silicon wafer. These trends are poised to continue as advanced industries emphasise compact, efficient designs to meet evolving consumer and industrial demands.