CY8541 Silicon (Si) Crystal Substrate (111) 10x10 mm

Silicon (Si) Crystal Substrate (111) 10x10 mm Description

This Silicon (Si) Crystal Substrate (111) 10×10 mm offers a consistently uniform and stable foundation for a variety of research and industrial applications. The (111) crystallographic orientation provides exceptional lattice uniformity, making it suitable for advanced semiconductor device development, epitaxial growth, and surface science studies. Manufactured to stringent purity standards, this substrate has minimal defects and a remarkably smooth surface. Its single-crystal structure ensures predictable charge carrier behaviour and outstanding thermal stability.

Meeting rigorous quality benchmarks, each substrate undergoes meticulous inspection to guarantee precision cutting, consistent thickness, and superior flatness. These characteristics accommodate the production of high-performance components and chips, supporting microelectronics, MEMS, and sensor fabrication. The dependable material quality and orientation accuracy make this substrate a valuable solution for those seeking excellence in both research and production environments.

Silicon (Si) Crystal Substrate (111) 10x10 mm Applications

Silicon (Si) Crystal Substrate (111) 10x10 mm is valued for its precise atomic orientation, high purity, and excellent electrical properties. Its uniform crystal structure supports advanced semiconductor technology, while the (111) surface orientation enhances compatibility with epitaxial growth processes. This combination of precision, stability, and conductivity makes the substrate highly versatile, enabling breakthrough solutions in industrial, research, and commercial settings.

1. Industrial Applications

·         Wafer Manufacturing: Enables the production of high-performance integrated circuits and power devices.

·         Sensor Production: Provides a stable crystal foundation for sensors, ensuring precise and reliable measurements in harsh environments.

2. Research Applications

·         Thin Film Studies: Offers an ideal surface for investigating material growth and deposition techniques.

·         Quantum Computing: Serves as a reliable substrate for testing quantum devices and studying novel computational architectures.

3. Commercial Applications

·         Optoelectronics Devices: Facilitates the development of innovative displays, photonic components, and communication modules.

·         Consumer Electronics: Forms the basis of advanced processors and specialized chips found in smartphones, wearables, and more.

Silicon (Si) Crystal Substrate (111) 10x10 mm Packaging

Each 10x10 mm Silicon (Si) Crystal Substrate (111) is carefully packaged in an antistatic pouch and cushioned with foam inserts to prevent mechanical damage. An airtight, moisture-resistant container ensures protection against humidity. The substrate should be stored in a clean, dust-free environment at room temperature. Double sealing further minimises contamination risks. Custom options include specialised coatings, thickness variations, and unique orientation markings.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Silicon (Si) Crystal Substrate (111) 10x10 mm FAQs

Q1: What are the key material properties of Silicon (Si) Crystal Substrate (111) 10x10 mm?

A1: This substrate is single-crystal silicon with a (111) orientation, offering a consistent lattice plane for advanced device fabrication. It typically has a resistivity range between 1 and 10 Ω·cm, ensuring stable electron mobility. The surface is polished on one side, achieving a roughness under 5 Å. Its 99.9999% purity yields a uniform composition conducive to reliable microelectronics processes. Furthermore, its well-defined crystallographic structure supports epitaxial growth for various semiconductor routines.

Q2: How should this product be handled and stored?

A2: When handling the substrate, wear clean gloves to prevent contamination and avoid direct contact with the polished surface. Use dedicated tweezers or vacuum wands to minimise mechanical stress. Store in a clean, low-humidity environment, ideally in a nitrogen-purged desiccator. Protect it from extreme temperature fluctuations to preserve crystallographic integrity. Individually pack each substrate in an anti-static container to prevent surface damage.

Q3: Which quality standards and certifications apply to Silicon (Si) Crystal Substrate (111) 10x10 mm?

A3: Industry-recognised certifications such as ISO 9001:2015 and ISO 14001:2015 often apply to the manufacturing processes, ensuring consistent quality and environmental responsibility. Substrates also meet SEMI M1 specifications, covering dimensional tolerances, surface roughness, and overall defect density. Additionally, documentation may reference ASTM F76 or equivalent standards for resistivity measurements and doping profiles. Compliance with RoHS and REACH regulations is typically guaranteed to meet global market requirements.

Related Information

1. Manufacturing Process

Manufacturing the Silicon (Si) Crystal Substrate (111) 10x10 mm typically begins with the careful selection of monocrystalline silicon ingots. These ingots are grown under strictly controlled thermal and atmospheric conditions to maintain uniformity in crystal orientation and purity. Advanced pulling methods, such as the Czochralski technique, help achieve an excellent crystalline structure that aligns perfectly with the (111) orientation. This ensures minimal defects, making it suitable for devices that demand high precision and stability.

During the crystal shaping phase, the ingot is sliced into substrates using specialised diamond-cutting equipment designed to achieve consistent thickness and superior surface quality. Each substrate is then subjected to a polishing process that refines the surface roughness, allowing for smooth interfaces in subsequent applications. Precise dimensional control, resulting in a 10x10 mm format, ensures compatibility with a wide range of microfabrication systems and enhances yield in semiconductor production lines.

2. Applications in Advanced Industries

Forward-thinking sectors such as microelectronics, sensor technology, and photonics rely on the (111) crystal orientation for applications demanding low defect densities and optimal charge carrier mobility. The Silicon (Si) Crystal Substrate (111) 10x10 mm is particularly valued in these industries for its ability to maintain structural integrity under intense processing steps, including high-temperature diffusion and ion implantation. Its stable lattice arrangement further contributes to efficient conduction pathways, vital for critical wafer-level electronics.

In the realm of quantum computing and novel integrated circuits, this specialised substrate provides an excellent foundation for research and engineering breakthroughs. Its precise 10x10 mm size accommodates advanced lithography techniques, ensuring accurate device patterning and reduced material waste. Researchers often exploit the (111) crystallographic plane to study new quantum dot architectures and spintronic components, making it a core material for innovations at the forefront of modern technology.