CY8546 Silicon (Si) Crystal Substrate (110) Dia. 2 inch

Silicon (Si) Crystal Substrate (110) Dia. 2 inch Description

Crafted from high-purity, monocrystalline silicon with the (110) orientation, our Dia. 2-inch substrate is carefully cut and polished to deliver uniformity. This orientation is particularly beneficial for a variety of microelectronic applications, including sensor fabrication, transistor arrays, and research in semiconductor physics. Our substrates meet stringent quality inspections to conform to industry standards, ensuring minimal surface roughness, low resistance variance, and integrity. With a consistent thickness and minimal bow or warp, they provide a foundation for device processing. Whether for production or research, our Silicon (Si) Crystal Substrate (110) Dia. 2 inch stands out for its performance, repeatability, and compliance with global semiconductor manufacturing requirements.

Silicon (Si) Crystal Substrate (110) Dia. 2 inch Applications

Silicon (Si) Crystal Substrate (110) Dia. 2 inch are widely recognised for their purity, crystallographic orientation, and stable structural properties. They play a role in numerous industries, from microelectronics to research fields. Their crystalline arrangement offers electrical conductivity, making them ideal for use in sensors, semiconductor devices, and research. This combination of orientation and surface properties sets them apart for various applications.

1. Industrial Applications

·        Precision Wafer Fabrication: The (110) orientation enhances mechanical strength and etching characteristics, enabling the production of microelectromechanical systems.

·        High-Performance Sensors: Electronic properties facilitate accurate detection and measurement in manufacturing and process control.

2. Research Applications

·        Quantum Device Prototyping: The stable crystal structure supports the development of electronic and quantum systems in academia and R&D labs.

·        Surface Science Studies: Uniform surfaces are ideal for investigating chemical reactions and material properties at the atomic level.

3. Commercial Applications

·        Semiconductor Devices: Conductivity and crystallographic orientation are crucial for building integrated circuits in consumer electronics.

·        Photonics Components: The precise lattice arrangement enhances optical properties, supporting photonics systems in communication technologies.

Silicon (Si) Crystal Substrate (110) Dia. 2 inch Packaging

Each 2-inch Silicon (Si) (110) substrate is individually packaged within a sealed anti-static pouch, lined with foam inserts to avoid mechanical damage. These pouches are further enclosed in moisture barrier bags with desiccant packs to maintain dryness and prevent contamination. For storage, substrates should be kept in a clean, low-humidity environment. Custom labeling, specialised foam shapes, and double-packaging options are available upon request to accommodate unique shipping or handling requirements.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Silicon (Si) Crystal Substrate (110) Dia. 2 inch FAQs

Q1: What are the key material properties of Silicon (Si) Crystal Substrate (110) Dia. 2 inch?

A1: The Silicon (Si) Crystal Substrate (110) with a diameter of 2 inches exhibits specific electrical, mechanical, and optical characteristics that make it essential for advanced applications. Among its key properties are high carrier mobility, defined orientation along the (110) plane, low defect density, and thermal conductivity. This substrate is widely utilised in microelectronics, photovoltaic cells, and semiconductor-based research projects.

Q2: How should this product be handled and stored?

A2: To maintain the substrate’s condition, operators should handle the wafer with powder-free gloves and soft tweezers or vacuum wands to avoid contamination and physical damage. Avoid direct contact with bare hands and store the substrate in a clean, dry environment in dedicated wafer carriers or specialised packaging. Proper handling reduces contamination and preserves surface integrity for subsequent processing.

Q3: Which quality standards and certifications apply to Silicon (Si) Crystal Substrate (110) Dia. 2 inch?

A3: The Silicon (Si) Crystal Substrate (110) Dia. 2 inch typically adheres to industry-specific standards, such as SEMI M1 for wafer geometry and surface specifications, ensuring uniform thickness, diameter, and flatness. Manufacturers often operate under ISO 9001-certified quality management systems to guarantee traceability and consistent product performance. Meeting these standards supports reliable semiconductor processing and assures end-users of the substrate’s quality and reproducibility.

Related Information

1. Material Properties and Advantages

Engineered for precise crystallographic orientation, the Silicon (Si) Crystal Substrate (110) Dia. 2 inch provides a platform for semiconductor fabrication. Its (110) orientation ensures near-uniform atomic spacing across the surface, promoting predictable etching behaviour and facilitating pattern transfers during lithographic processes. This type of silicon substrate is known for its stable mechanical properties, making it less susceptible to cracking or warping under conditions of microelectronics production.

These substrates exhibit electrical conductivity that can be tailored through controlled doping procedures, enabling researchers and manufacturers to fine-tune wafer performance in applications. The 2 inch diameter format offers a balance between manageable handling and sufficient surface area for prototyping or smaller-scale device production. With thermal stability, the Silicon (Si) Crystal Substrate (110) Dia. 2 inch maintains its integrity through heating and cooling cycles, ensuring consistent results for microchip designs.

2. Global Market Trends

Driven by the demand for efficient, miniaturised electronic devices, silicon (110) substrates have gained attention in regions that emphasise chip development. Nations focusing on integrated circuit innovation have embraced 2 inch diameter wafers as standardised materials in research, setting the stage for production. These factors support the expansion of silicon (110) wafer technologies, leading to growth and collaboration among fabrication facilities.

Rising interest in such versatile substrates is further supported by advancements in artificial intelligence, high-frequency communication systems, and photonic devices. The compatibility of silicon (110) wafers with many existing processes allows these applications to flourish without requiring extensive redesign of manufacturing lines. This adaptability and opportunities for product enhancement position the Silicon (Si) Crystal Substrate (110) Dia. 2 inch at the forefront of the evolving market, promising sustained relevance for years to come.