CY8925 Tungsten Disulphide Film on SiO2/Si Substrate WS2 Film 10x10 mm

Tungsten Disulfide Film on SiO2/Si Substrate WS2 Film 10x10 mm Description

Our high-quality tungsten disulphide (WS2) film on a 10×10 mm SiO2/Si substrate combines exceptional stability with well-defined electronic and optical properties. Grown under controlled conditions, this two-dimensional transition metal dichalcogenide showcases uniform layer thickness and minimal defects. Its layered structure provides a sizeable band gap and excellent thermal and chemical stability, making it suitable for research in electronics, photonics, and sensing technologies.

Each WS2 film undergoes rigorous inspection to ensure consistent thickness, purity, and crystallinity. These stringent quality standards guarantee optimal device performance and reproducibility for academic and industrial applications. Whether you are exploring semiconductor research, developing sensors, or investigating advanced optoelectronic designs, this WS2 film on SiO2/Si substrate offers the reliability and efficiency demanded by scientific endeavours.

Tungsten Disulfide Film on SiO2/Si Substrate WS2 Film 10x10 mm Applications

This tungsten disulphide film on a SiO2/Si substrate offers a range of features, including chemical stability, mechanical strength, and electronic properties. Its layered 2D structure and tailored thickness enable specialised solutions across electronics, research, and commercial sectors. By leveraging its unique qualities, users can develop technologies prioritising performance, reliability, and efficiency.

1. Industrial Applications

·         High-performance lubricative coatings, reducing friction and wear in manufacturing tools

·         Durable protective layers for chemical processing equipment, enhancing corrosion resistance

·         Advanced thermal management solutions for automotive components, improving overall efficiency

2. Research Applications

·         Transistor channels in semiconductor studies, exploiting WS2’s carrier mobility

·         Photodetector prototyping for optoelectronics, leveraging its tunable optical properties

·         Catalysis experiments in chemical engineering, benefiting from the film’s chemical stability

3. Commercial Applications

·         Flexible electronics and displays, utilising the film’s adaptable 2D structure

·         Sensors in healthcare, enabling more accurate patient diagnostics

·         Enhanced solar cell designs in renewable energy systems, improving light absorption and conversion rates

Tungsten Disulfide Film on SiO2/Si Substrate WS2 Film 10x10 mm Packaging

Each 10 x 10 mm Tungsten Disulphide (WS2) Film on SiO2/Si Substrate is carefully sealed in an anti-static, moisture-resistant pouch with foam cushioning. This provides protection against mechanical damage, humidity, and contaminants. Store the packaged films in a clean, dry environment at room temperature. Optional nitrogen-purged containers are available to further reduce oxidation risks. Custom packaging solutions are offered upon request to suit specific research or production requirements.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Tungsten Disulfide Film on SiO2/Si Substrate WS2 Film 10x10 mm FAQs

Q1: What are the key material properties of Tungsten Disulphide Film on SiO2/Si Substrate WS2 Film 10x10 mm?

A1: The material properties of tungsten disulphide film on SiO2/Si substrate revolve around its layered structure, distinct semiconducting bandgap, and strong in-plane stiffness. Typical thickness uniformity ensures consistent optical and electronic behaviour, while the film’s surface chemistry provides stable performance under standard environmental conditions. The WS2 film exhibits high thermal stability, low friction characteristics, and remarkable photoresponsivity, making it suitable for electronic and photonic applications.

Q2: How should this product be handled and stored?

A2: This product should be handled in a clean environment with gloves to minimise particulate and oil contamination. Avoid exposing the film to excessive humidity or extreme temperatures for extended periods. If possible, store each substrate in individual, static-free packaging within a desiccator or sealed container. This helps preserve the film’s structural integrity, preventing unwanted oxidation or surface degradation, ensuring reliable performance in subsequent processing and testing steps.

Q3: Which quality standards and certifications apply to Tungsten Disulphide Film on SiO2/Si Substrate WS2 Film 10x10 mm?

A3: Quality assurance for tungsten disulphide film typically follows recognised standards for semiconductor materials, such as ISO 9001 for manufacturing consistency and reliability. The production process often includes thorough measurements of film thickness, uniformity, and adhesion. Some producers also verify compliance with environmental directives like RoHS or REACH, ensuring minimal hazardous substances. These standards help guarantee product performance, repeatability, and traceability throughout the supply chain for commercial and industrial applications.

Related Information

1. Manufacturing Process

Optimised chemical vapour deposition (CVD) techniques are commonly employed to achieve uniform and high-quality Tungsten Disulphide (WS2) films on SiO2/Si substrates. During this process, precisely controlled temperatures and gas flow rates ensure consistent layer thickness across the 10x10 mm sample area. By carefully managing growth conditions, manufacturers can produce WS2 films with excellent coverage, reduced defect density, and strong adhesion to the underlying silicon dioxide layer.

Maintaining a stable environment throughout deposition is crucial for minimising contamination and preserving the WS2 lattice structure. Meticulous control over precursor composition and carrier gas purity helps achieve enhanced crystallinity and reproducibility. As a result, these films exhibit tightly controlled electrical, optical, and mechanical properties, making them suitable for a broad range of commercial and research applications.

2. Global Market Trends

Recent reports indicate a growing global interest in two-dimensional materials like WS2, driven by their beneficial properties in areas such as nanoelectronics, optoelectronics, and energy storage. The demand for 10x10 mm Tungsten Disulphide films on SiO2/Si substrates is particularly pronounced in regions with thriving semiconductor and advanced materials sectors, where research institutions and industry leaders collaborate on new device concepts.

Increased funding for research and development, along with strong cooperation among academic, commercial, and governmental stakeholders, has accelerated efforts to integrate WS2 in technologies. From sensitive sensors to layered electronic components, the expanding market recognises WS2 films as a versatile option for high-performance devices, setting the stage for continued investment and innovation in this specialised field.