CY9466 Nickel Single Crystal Substrate Ni Substrate (100), 10x5x0.5 mm, SSP

Nickel Single Crystal Substrate Ni Substrate (100), 10x5x0.5 mm, SSP Description

Nickel Single Crystal Substrate Ni Substrate (100), 10x5x0.5 mm, SSP is a monocrystalline nickel substrate characterised by its (100) crystallographic orientation. The dimensions of 10 mm x 5 mm x 0.5 mm are configured to minimise surface imperfections and ensure high lattice uniformity. This precise specification supports its use in epitaxial growth and semiconductor processing, where controlled crystallographic properties are critical to performance.

Nickel Single Crystal Substrate Ni Substrate (100), 10x5x0.5 mm, SSP Applications

1.       Electronics and Semiconductor Manufacturing
   - Used as a growth platform in epitaxial layer deposition to achieve uniform crystal alignment by leveraging the (100) orientation.
   - Applied in thin film sensor fabrication to improve interface smoothness and minimise defect-induced scattering.

2.       Industrial and Research Applications
   - Serves as a material benchmark in crystallographic studies to analyse grain boundary behaviour using its uniform, single crystal structure.
   - Frequently used in scanning probe microscopy as a substrate to provide a smooth, dislocation-minimised surface for accurate nano-scale measurements.

Nickel Single Crystal Substrate Ni Substrate (100), 10x5x0.5 mm, SSP Packing

The substrate is securely packaged in an antistatic pouch and cushioned with foam inserts to prevent mechanical damage and contamination during transit. It should be stored in a dry, temperature-controlled environment to preserve crystal integrity. Optional packaging with inert gas flushing is available for applications that require enhanced protection against oxidation and surface contamination.

Frequently Asked Questions

Q1: What specific surface characterisation techniques are implemented during production?
A1: The production process integrates SEM-based surface analysis to assess crystal orientation and defect density. This allows for real-time quality monitoring and ensures that the substrate meets strict crystallographic standards required in high-precision applications.

Q2: How does the (100) orientation influence epitaxial growth?
A2: A (100) orientation facilitates consistent epitaxial deposition by providing a uniform lattice structure. This minimises mismatch issues during film growth, thus improving the alignment and performance of the deposited layers in semiconductor devices.

Q3: Are these substrates compatible with standard semiconductor processing equipment?
A3: Yes, the dimensions and surface quality of the substrate are designed for integration with existing semiconductor processing systems, ensuring compatibility with routine fabrication practices and equipment protocols.

Additional Information

Single crystal substrates are critical in materials research, especially in the study of epitaxial layer growth and crystallographic defect analysis. Their well-defined lattice structures enable precise evaluation of surface properties, which is fundamental in improving semiconductor processing techniques. The use of advanced analytical methods, such as SEM, in substrate fabrication helps optimise the material properties for stringent industrial applications.

Nickel substrates have significant importance in non-ferrous metal applications due to their stable physical characteristics and resistance to oxidation. Advances in crystal growth techniques have enhanced the ability to control the orientation and uniformity of these substrates, supporting a wide array of industrial and research applications that rely on high-performance, defect-minimised materials.