CY9474 Nickel Single Crystal Substrate Ni Substrate (111), 10x10x1 mm, SSP

Nickel Single Crystal Substrate Ni Substrate (111), 10x10x1 mm, SSP Description

Nickel Single Crystal Substrate Ni Substrate (111), 10x10x1 mm, SSP is a monocrystalline nickel wafer exhibiting a (111) crystallographic orientation. Its dimensions of 10x10x1 mm provide suitable compatibility with standard material characterisation and semiconductor processing systems. The substrate features an atomically flat surface structure and minimal crystalline defects, which is critical for studies requiring uniform electronic and surface properties. Detailed surface morphology analysis ensures the material meets stringent research protocols.

Nickel Single Crystal Substrate Ni Substrate (111), 10x10x1 mm, SSP Applications

Electronics and Semiconductor Processing
- Used as a substrate in thin film deposition to achieve uniform film growth by leveraging the atomically flat, defect-minimised surface.
- Applied as a calibration standard in electron microscopy to ensure consistent imaging parameters through its well-defined crystallography.

Industrial and Research Applications
- Employed as a sample material in corrosion testing to evaluate nickel behaviour under controlled environmental conditions by utilising its uniform single crystal structure.
- Serves as a reference material in materials science research to validate surface treatment processes thanks to its consistent morphological properties.

Nickel Single Crystal Substrate Ni Substrate (111), 10x10x1 mm, SSP Packing

The substrate is packaged in a static-dissipative pouch and secured in a cushioned, foam-lined container to mitigate vibration and physical impact during transit. It is stored in a controlled, dry environment at room temperature to avoid surface contamination and oxidation. Custom packaging options, including anti-static labels and compartmentalised trays, are available upon request to adhere to specific handling protocols.

Frequently Asked Questions

Q1: How does the (111) orientation affect the substrate's performance in material characterisation?
A1: The (111) orientation enhances the uniformity of atomic arrangements, which is essential for accurate electron microscopy and diffraction analyses. This consistency supports more reproducible experimental outcomes in research applications.

Q2: What measures are taken during fabrication to minimise crystalline defects?
A2: The substrate is produced using controlled crystal growth methods and undergoes SEM surface mapping to identify and minimise defects. This process ensures the substrate meets strict material consistency required for precision experiments.

Q3: What storage conditions are recommended to maintain the substrate's surface integrity?
A3: It is advisable to store the substrate in a dry, temperature-stable environment within a static-free package. This minimises the risk of contamination and oxidation, ensuring the surface properties remain intact for subsequent use.

Additional Information

Single crystal substrates play a crucial role in advanced material research and semiconductor processing. The precise control of crystal orientation affects the electronic and structural properties of deposited thin films. Researchers rely on these substrates for consistent experimental setups and reliable validation of material performance.

Nickel-based substrates also serve as an important reference in studies related to corrosion resistance and metallurgical behaviour. Understanding the interaction between crystal orientation and surface treatment techniques can lead to more accurate predictions of material behaviour in industrial applications.