ST11190 Indium Planar Sputtering Target, In Target

Indium Planar Sputtering Target, In Target Description

Indium Planar Sputtering Target, In Target is an indium-based sputtering target utilised in plasma deposition systems. It is manufactured with high-purity indium (In) to minimise impurities during film formation. The customisable dimensions allow for integration into various deposition chambers, ensuring uniform target erosion and consistent film uniformity. Its planar design enhances process reproducibility in semiconductor and optoelectronic manufacturing.

Indium Planar Sputtering Target, In Target Characteristics

The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Indium Planar Sputtering Target, In Target Applications

Electronics
- Used as a sputtering source in semiconductor deposition systems to achieve uniform thin films by leveraging its customisable dimensions.
- Applied as a target in display manufacturing to improve film interface quality and homogeneity.

Industrial
- Serves as an electrode material in thin-film sensors to enhance electrical signal consistency by utilising its high-purity indium.
- Frequently used in solar cell fabrication to deposit transparent conductive films, taking advantage of its tailored planar design.

Commercial
- Employed in optical coating processes to provide consistent film layers, thereby improving device performance through controlled deposition rates.

Indium Planar Sputtering Target, In Target Packing

The target is packaged in an anti-static, dust-free environment using sealed, rigid containers to prevent contamination and mechanical damage. Protective foam and desiccant materials are incorporated to maintain a stable environment. Customised packaging options, including vacuum-sealed containers and precise labelling, are available for applications requiring specialised storage conditions.

Additional Information

Indium is a soft, ductile metal that plays a critical role in thin-film deposition technology. Its low melting point and high purity make it suitable for electrical contacts and specialised coatings. The planar design of sputtering targets enhances uniformity during deposition, which is vital for advanced electronic and optoelectronic applications.

Understanding the material characteristics of indium helps in optimising deposition conditions and achieving precise film properties. In research and industrial environments, detailed characterisation of material behaviour under sputtering conditions ensures that targets perform consistently, facilitating improved process control and device performance.